Mitsubishi Denki Kabushiki Kaisha

Makoto Kanno

Koichi Moriizumi

Hironobu Taoka

Kinya Kamiyama

Hiroomi Nakao

Kazuhiro Yamazaki

A pattern comparison inspection system includes: an occupancy calculating portion for dividing pattern data into pixel regions and calculating a ratio of divided pattern data to a pixel region; a gray level bit map generating portion for generating a gray level bit map based on the ratio of the divided pattern data; and a bit map comparing portion for making a comparison between a gray level bit map for design pattern data and a gray level bit map for pattern data for an electron beam patterning system both generated by the occupancy calculating portion and the gray level bit map generating portion to determine whether the pattern data for an electron beam patterning system matches the design pattern data.

Pattern comparison inspection system and method employing gray level bit

A charged beam pattern data generating method for generating high quality pattern data from the circuit layout design data of a semiconductor device for use by a charged beam drawing apparatus in the production of resist patterns or other semiconductor device manufacturing processes.

Charged beam pattern data generating method and a charged beam pattern

A system for preventing deterioration of dimensional accuracy by reducing production of micro graphics at the time of production of drawing data to be input to a charged particle beam drawing apparatus. A CPU divides a design layout data into units of graphic data processing area (a step S1) and executes elimination of duplication and tone reversal processes in both X direction and Y direction (steps S2A, S2B) for the respective graphic data processing areas. Moreover, it performs, with reference to a micro graphic dimensional value, the graphic data processing result judging and selecting function in both the X direction and Y direction (a step S3) for the respective graphic data processing areas. Namely, the CPU judges as the micro graphic when the dimension of a basic graphic after the elimination of duplication and tone reversal processes is no larger than the micro graphic dimensional value, compares the two by determining the sum of such micro graphics, for example, in the X, Y directions and selects the graphic data submitted to the elimination of duplication and tone reversal process for the direction with smaller value. The CUP further performs prescribed processing (steps S4, S5) of this graphic data to complete the production of drawing data.

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Hyogo, Japan

Makoto Kanno