Rigaku Corporation

Makoto Kambe

Kazuhiko Omote

Licai Jiang

Boris Verman

Hideaki Takahashi

Kiyoshi Ogata

Yoshiyasu Ito

Masahiro Nonoguchi

Yuriy Platonov

Hiroshi Motono

Naohisa Osaka

Ladislav Pina

Sei Yoshihara

Katsutaka Horada

Shigematsu Asano

Shiro Umegaki

Tsutomu Tada

Bonglea Kim

Yoshihiro Takeda

Ryotaro Yamaguchi

Takao Kinefuchi

Akifusa Higuchi

Hajime Fujimura

Jiri Marsik

Vaclav Jelinek

Martin Horvarth

Toshifumi Higuchi

Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

Total reflection x-ray fluorescence spectrometer

In an X-ray inspection device according to the present invention, an X-ray irradiation unitincludes a first X-ray optical elementfor focusing characteristic X-rays in a vertical direction, and a second X-ray optical elementfor focusing the characteristic X-rays in a horizontal direction. The first X-ray optical elementis constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.

X-ray inspecting device, X-ray thin film inspecting method, and method for measuring rocking curve

The X-ray generating apparatusapplies an electron beam eonto a targetto generate X-rays x, and includes a permanent magnet lensconfigured to focus the electron beam e, a correction coilprovided on a side of the electron beam ewith respect to the permanent magnet lensand configured to correct a focus position formed by the permanent magnet lensin a traveling direction of the electron beam e, and a targetonto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam ecan be finely adjusted.

X-ray generating apparatus

There is provided an X-ray image photographing method and an X-ray image photographing apparatus capable of photographing a high resolution phase contrast image and a high resolution absorption contrast image in a short time according to the purpose only by finely adjusting the distance between a specimen and a detector with respect to an X-ray source. The X-ray image photographing method enables photographing of a fine structure with a high space resolution while d/L is sufficiently smaller than 1, when L is a distance from an X-ray sourceto a specimenand d is a distance from the specimento a detector. Further, a distance between a peak position and a valley position of a phase contrast is not less than &#x2153;&#x394; and not more than 3&#x394;, when &#x3bb; is an average wavelength of the X-ray and &#x394; is a resolution of the detector

X-ray image photographing method and X-ray image photographing apparatus

Growing community of inventors

Tokyo, Japan

Makoto Kambe