Hitachi, Ltd.

Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Materials Corporation

Mitsubishi Materials Silicon Corporation

Hitachi Industrial Products, Ltd.

Makoto Imura

Takeshi Mori

Yasuhiro Naka

Takayuki Koyama

Kenji Kusakabe

Kenichi Sugimoto

Masanori Matsumoto

Shinji Sugimoto

Daisuke Kori

Shigeki Nakae

Motonobu Iizuka

Kazuo Nishihama

Masanori Sawahata

Tomohiro Naruse

Motonobu Iiduka

Yuuichirou Yoshitake

Kengo Ueda

Hideyuki Ootaka

There is provided a rotary electric machine that ensures improving a maximum torque and a rated power factor while reducing an increase in a starting current. In view of this, the rotary electric machine includes a shaft, a rotor, and a stator. The rotor is fixed to an outer periphery of the shaft. The stator is located so as to surround an outer periphery of the rotor. The rotor includes a rotor iron core including a plurality of rotor slots located at predetermined intervals in a circumferential direction and rotor bars inserted into the rotor slots. Rotor slits communicate with outer peripheral sides of the rotor slots. The rotor slits have a width ws in a circumferential direction. The width ws is smaller than a height hs in a radial direction of the rotor slit, and when a rated current is denoted as I, a turn ratio (primary/secondary) is denoted as Tr, and a magnetic permeability in a vacuum is denoted as &#x3bc;, a relationship of ws&#x3e;&#x3bc;&#xd7;I&#xd7;Tr/0.6 is met.

Rotary electric machine and drive system using same

A coil support structure including a coil spacer, a yoke spacer, and a support formed between the coil spacer and the yoke spacer. And the support has laterally protruding parts.

Rotating electric machine

An electrical rotating machine is provided with a salient-pole rotor, which is composed of magnetic field pole bodies integrally formed with a shaft and pole shoes constituting magnetic field pole heads. Each pole shoe is fixedly joined on the corresponding one of the magnetic field pole bodies with a plurality of bolts. Each pole shoe or its corresponding magnetic field pole body is provided with at least one protrusion or recess for restricting a conically-shaped compression domain in a compression domain that occurs in the pole shoe when the pole shoe is joined on the corresponding magnetic field pole body with the bolts.

Electrical rotating machine

A silicon wafer having a low concentration of carbon and a silicon wafer having a high concentration of carbon are joined and polished to prescribed thicknesses to form a semiconductor substrate according to the present invention.

Semiconductor substrate having a gettering layer

A silicon wafer having a low concentration of oxygen and a silicon wafer having a high concentration of oxygen are joined and polished to prescribed thicknesses to form a semiconductor substrate according to the present invention. A region formed of the wafer having a low concentration of oxygen is used as a region where an element is formed, and a region formed of the wafer having a high concentration of oxygen produces a gettering effect on metal impurities and defects. As a DZ layer having a low concentration of oxygen, a wafer manufactured by an MCZ method or a wafer manufactured by a CZ method is used after being heat-treated at high temperature to diffuse oxygen outward. In another example, a damage layer, a polycrystalline silicon layer, an amorphous silicon layer or the like is formed between a DZ layer and an IG layer.

Growing community of inventors

Tokyo, Japan

Makoto Imura