Mitsubishi Electric Corporation

Makoto Hirakawa

Toshio Araki

Toshihiko Iwasaka

Tomoki Nakamura

Source wires having a semiconductor film thereunder are formed wide within a range that does not overlap pixel electrodes formed later. Thereafter, a resist pattern for use in patterning the pixel electrodes is formed so as to overlap edge portions of the source wires, and etching using the resist pattern as a mask is performed, whereby the pixel electrodes are formed, and in addition, the edge portions of the source wires are removed, whereby a structure in which the semiconductor film has a portion projecting beyond the source wires on both sides is formed.

Thin film transistor array substrate and manufacturing method thereof, and liquid crystal display device and manufacturing method thereof

A liquid crystal display element includes: a first substrate having a first surface and including a pixel electrode; a second substrate having a second surface opposing to the first surface, and including a light-shielding film, a thickness adjusting film and a counter electrode arranged in sequence in a direction to the second surface; a sealing material having a frame-shape to bond the first substrate and the second substrate; a liquid crystal layer provided in a region surrounded by the sealing material and between the first substrate and the second substrate, wherein the thickness adjusting film is provided to cover the light-shielding film to define the thickness of the liquid crystal layer, and has a contact hole, wherein the counter electrode is provided to oppose to the pixel electrode, and electrically connected to the light shielding film via the contact hole.

Growing community of inventors

Kumamoto, Japan

Makoto Hirakawa