Merck Patent Gmbh

Maki Ishii

Tatsuro Nagahara

Kazuma Yamamoto

Tomoyasu Yashima

[Problem] To provide a semiconductor aqueous composition capable of preventing a pattern collapse and suppressing a bridge defect. [Means for Solution] A semiconductor aqueous composition comprising a single or plurality of surfactant(s) having a monovalent anion part represented by formula (I): Chain 1-X—X-Chain 2 (I) wherein, Xand Xare each independently —C(=0)- or —S(=0)-, and Chain 1 and Chain 2 are each independently a linear or branched Calkyl, wherein one or more H in said Calkyl are replaced by F, and one or more methylenes in Chain 1 may be replaced by -0-, with the proviso that Chain 1 and Chain 2 may be bonded to form a ring structure) and a monovalent cation part other than hydrogen ion; and water.

Semiconductor aqueous composition and use of the same

The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.

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Kakegawa, Japan

Maki Ishii