United Microelectronics Corp.

Other

Mainn-Gwo Chen

Chuan H Liu

Kuan-Yu Fu

Ming-Jer Chen

Chin-Kun Lo

A method is described for taking a lifetime measurement of an ultra-thin dielectric layer. In order to discover the life time of the ultra-thin dielectric layer, the measurement comprises using about one half of a stress voltage to measure a time-dependent leakage current of the ultra-thin dielectric layer.

Lifetime measurement of an ultra-thin dielectric layer

A LOCOS method uses a reagent mixed of etchant and oxidizer to simultaneously perform the step of forming the FOX layer and the step of removing a mask layer of the conventional LOCOS method. The applied temperature is about 950-1150&deg; C. The etchant. such as a HF acid solution, is used to remove the mask layer, and the oxidizer, such as O,, is used to form the FOX layer on a silicon substrate.

Method of local oxidation using etchant and oxidizer

An electrostatic discharge protective circuit formed by use of a silicon controller rectifier is coupled to an input port and an internal circuit for discharging electrostatic charges on the input port to ground. When the electrostatic charges are applied on the input port, a punch-through effect is created between a first P-type diffusion region and a second N-type diffusion region to turn on a parasitic NPN bipolar junction transistor. At the same time, a voltage is applied on a gate of the MOS transistor via a small-signal equivalent capacitor to turn on itself, thereby discharging the electrostatic charges. Accordingly, the trigger voltage of the silicon controller rectifier can be efficiently lowered to improve the electrostatic discharge protective capability of the silicon control rectifier.

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Taichung, Taiwan

Mainn-Gwo Chen