Kobe Steel, Ltd.

Maiko Abe

Kenji Yamamoto

Koichiro Akari

Mamoru Hosokawa

Hiroaki Nii

Provided are a nitriding apparatus and a method of nitriding, which are capable of suppressing generation of a compound layer by accurately measuring temperature of an object to be treated by nitriding. A nitriding apparatus includes a chamber, a gas supplying unit, a support, a plasma source, a heater, a thermocouple wire including a temperature measuring section, an accommodating member, a power supply for an object to be treated, and a treatment condition control unit. The accommodating member internally accommodates the thermocouple wire to cover the temperature measuring section, while being insulated from the thermocouple wire. The power supply for an object to be treated applies a predetermined voltage to an object to be treated and the housing member so that the object to be treated and the accommodating member are set to an identical potential on the negative side.

Nitriding apparatus and nitriding method

A laminated hard coating comprising a layer A and a layer B, wherein the layer A and the layer B differ in composition and are laminated. Layer A contains (MAlCrTa)(BCN) and satisfies 0&#x2264;a&#x2264;0.35, 0.05&#x2264;d&#x2264;0.35, 0&#x2264;x&#x2264;0.15, 0&#x2264;y&#x2264;0.50, a+b+c+d=1, and x+y+z=1. M is at least one element selected from the group consisting of V, Nb, Mo, and W; a, b, c and d represent the atomic ratios of M, Al, Cr, and Ta, respectively; and x, y, and z represent the atomic ratios of B, C and N, respectively. The layer B comprises (TiSi)(BCN) and satisfies 0.05&#x2264;&#x3b2;&#x2264;0.35, 0&#x2264;x&#x2264;0.15, 0&#x2264;y&#x2264;0.50, &#x3b1;+&#x3b2;=1, and x+y+z=1. &#x3b1; and &#x3b2; represent the atomic ratios of Ti and Si, respectively, and x, y, and z represent the atomic ratios of B, C, and N, respectively. One or more layers of each of these layers have been alternately laminated.

Laminated hard film and cutting tool

A cutting tool has a substrate. A surface of the substrate for the cutting tool is covered with a hard film. In the cutting tool, the hard film has a root-mean-square slope R&#x394;q in a surface of the hard film of 0.060&#xb0; or less.

Cutting tool

Disclosed is a hard coating including a chemical composition specified by formula: (TiAlSiR)O, where R represents at least one rare-earth element; and a, b, c, d, and x are atomic ratios respectively of Ti, Al, Si, R, and O. The atomic ratios meet conditions as specified by formulae: 0.30&#x2266;a&#x2266;0.7, 0.30&#x2266;b&#x2266;0.70, 0&#x2266;c&#x2266;0.2, 0.005&#x2266;d&#x2266;0.05, a+b+c+d=1, and 0.5&#x2266;a/b&#x3c;1. The atomic ratios meet a condition as specified by Formula (1) when R does not include Ce. The atomic ratios meet a condition as specified by Formula (2) when R includes Ce. The hard coating has better wear resistance as compared with conventional nitride films and oxide films.0.8&#x2266;[/(21.521.5)]&#x2266;1.2&#x2003;&#x2003;(1)0.8&#x2266;[/(21.522)]&#x2266;1.2&#x2003;&#x2003;(2)

Hard coating, method for manufacturing same, and hard-coated article

A laminated coating film according to the present invention comprises at least one coating film (A) and at least one coating film (B) laminated on each other and has excellent abrasion resistance. [Coating film (A)] The compositional formula is (MSi)(BCN) (wherein M represents at least one element selected from the group consisting of a Group-4 element, a Group-5 element, a Group-6 element and Al; and a, x and y respectively represent the atomic ratios of Si, B and C), wherein a, x and y respectively fulfill the formulae: 0.05&#x2266;a&#x2266;0.35, 0&#x2266;x&#x2266;0.15 and 0&#x2266;y&#x2266;0.5. [Coating film (B)] The compositional formula is L(BCN) (wherein L represents at least one element selected from the group consisting of W, Mo and V; and x and y respectively represent the atomic ratios of B and C), wherein x and y respectively fulfill the formulae: 0&#x2266;x&#x2266;0.15 and 0&#x2266;y&#x2266;0.5.

Laminated coating having excellent abrasion resistance

The present invention is a laminated coating film such that at least one of each of the below mentioned coating film (Q) and coating film (R) are laminated in alternation on a substrate. [Coating film Q] At least one coating film selected from the group consisting of: a coating film having a compositional formula of TiBCNand satisfying the atom ratios of each element being 0.2&#x2266;a&#x2266;0.7, 0&#x2266;b&#x2266;0.35, and 0&#x2266;c&#x2266;0.35; a coating film having a compositional formula of SiCNand satisfying the atom ratios of each element being 0.2&#x2266;d&#x2266;0.50 and 0&#x2266;e&#x2266;0.3; and a coating film having a compositional formula of BCNand satisfying the atom ratios of each element being 0.03&#x2266;f&#x2266;0.25 and 0&#x2266;g&#x2266;0.5. [Coating film R] A coating film having a compositional formula of L(BCN) (where L is at least one element selected from the group consisting of W, Mo, and V) and satisfying the atom ratios of each element being 0&#x2266;x&#x2266;0.15 and 0&#x2266;y&#x2266;0.5.

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Kobe, Japan

Maiko Abe