Asml Netherlands B.v.

Maikel Adrianus Cornelis Schepers

Daniel Jozef Maria Direcks

Danny Maria Hubertus Philips

Paul Petrus Joannes Berkvens

Clemens Johannes Gerardus Van Den Dungen

Pieter Mulder

Sergei Shulepov

Franciscus Johannes Joseph Janssen

Erik Henricus Egidius Catharina Eummelen

Markus Franciscus Antonius Eurlings

Koen Steffens

Marco Baragona

David Bessems

Hermanus Johannes Maria Kreuwel

Hrishikesh Patel

Marcus Johannes Van Der Zanden

Arnold Jan Van Putten

Maarten Kees Jan Boon

Bernard Jacob Andries Stommen

Jacob Cohen

Pepijn Wijnand Jozef Janssen

In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.

Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure

A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.

Radiation conduit for radiation source

A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

Fluid handling structure, lithographic apparatus and a device manufacturing method

A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.

Growing community of inventors

Nuenen, Netherlands

Maikel Adrianus Cornelis Schepers