Applied Materials, Inc.

Mahesh Ramakrishna

Lara Hawrylchak

Naman Apurva

Mehran Behdjat

Binh Nguyen

Prashant Agarwal

Sriharish Srinivasan

Michael P Kamp

Niraj Merchant

Yury Shustrov

Dietrich Gage

Christopher Dao

Patterned heater pedestal with groove extensions

Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of exhaust holes from the central opening to the first plenum; and at least one cutout in the central flange to provide a flow path from the first plenum to the second plenum, wherein the lower exhaust liner defines a gas flow path from the central opening to the first plenum via the plurality of exhaust holes and from the first plenum to the second plenum via the least one cutout.

Process chamber and exhaust liner system therefor

Gas distribution plate for a semiconductor processing chamber

Embodiments of the disclosure relate to methods for measuring temperature and a tool for calibrating temperature control of a substrate support in a processing chamber without contact with a surface of the substrate support. In one embodiment, a test fixture with a temperature sensor is removably mounted to an upper surface of a chamber body of the processing chamber such that the temperature sensor has a field of view including an area of the substrate support that is adjacent to a resistive coil disposed in the substrate support. One or more calibration temperature measurements of the area of the substrate support are taken by the temperature sensor and simultaneously one or more calibration resistance measurements of the resistive coil are taken corresponding to each calibration temperature measurement. Temperature control of a heating element disposed in the substrate support is calibrated based on the calibration temperature and calibration resistance measurements.

Non-contact temperature calibration tool for a substrate support and method of using the same

Heater pedestal

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Bengaluru, India

Mahesh Ramakrishna