University College Cork

Magall Brunet

Paul McCloskey

Sean Cian O'Mathuna

Terence O'Donnell

Stephen O'Reilly

Andrew Mark Connell

An insulating layer () and a conductive seed layer () are applied to a substrate () in a simple process. A photo resist with palladium chloride are provided in a bath for electrophoretic deposition onto the substrate. The photo resist is an insulator and the palladium chloride is a catalyst. The layer is heated with UV to cure it. The layer is plasma etched to expose more of the palladium chloride, which acts as a catalyst for electrodes plating of the conductive seed layer. A thicker conductive layer () is then electroplated onto the seed layer. These steps may be repeated for successive insulating and/or conductive layers.

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Bellegarde, France

Magall Brunet