Seoul National University

Samsung Electronics Co., Ltd.

Maenghyo Cho

Hyungwoo Lee

Byunghoon Lee

Changyoung Jeong

Junghwan Moon

Muyoung Kim

Sungwoo Park

Byunggook Kim

Jong Gu Lee

Junghyun Ryu

Yonghee Lee

Hyeok Seung Lee

Kyu Jin Cho

Duho Kim

Jin-Myoung Lim

Joonmyung Choi

Kyeong-jae Cho

Taesoon Hwang

Je Sung Koh

There are provided a lithography method capable of selecting best resist and a semiconductor device manufacturing method and exposure equipment based on the lithography method. The lithography method includes estimating a shape of a virtual resist pattern based on a multi-scale simulation for resist, forming a test resist pattern by performing exposure on selected resist based on the simulation result, comparing the test resist pattern with the virtual resist pattern, and forming a resist pattern on an object to be patterned by using the resist when an error between the test resist pattern and the virtual resist pattern is in an allowable range.

Lithography method using multi-scale simulation, semiconductor device manufacturing method and exposure equipment

A lithography method using a multiscale simulation includes estimating a shape of a virtual resist pattern for a selected resist based on a multiscale simulation; forming a test resist pattern by performing an exposure process on a layer formed of the selected resist; determining whether an error range between the test resist pattern and the virtual resist pattern is in an allowable range; and forming a resist pattern on a patterning object using the selected resist when the error range is in the allowable range. The multiscale simulation may use molecular scale simulation, quantum scale simulation, and a continuum scale simulation, and may model a unit lattice cell of the resist by mixing polymer chains, a photo-acid generator (PAG), and a quencher.

Lithography method using multiscale simulation, and method of manufacturing semiconductor device and exposure equipment based on the lithography method

Disclosed are a positive active material for a rechargeable lithium battery, a method of manufacturing the same, and a rechargeable lithium battery including the same. More specifically, the positive active material for a rechargeable lithium battery is a compound having an orthorhombic layered structure represented by the following Chemical Formula 1 or a compound represented by the following Chemical Formula 2, a method for producing the same, and a rechargeable lithium battery including the same.LiMO&#x2003;&#x2003;[Chemical Formula 1]{(LiMO)}.{(LiMO)}&#x2003;&#x2003;[Chemical Formula 2]

Positive electrode active material for rechargeable lithium battery, method for manufacturing same, and rechargeable lithium battery including same

Provided are a sequential joint behavior sheet using photo deformation and a method of controlling folding and unfolding thereof. The sequential joint behavior sheet includes at least three rigid parts, a first joint part joining two of the rigid parts that are adjacent to each other, and a second joint part joining two of the rigid parts that are adjacent to each other and spaced apart from the first joint part. Here, the first and second joint parts have a first state in which the same rigid state as the rigid parts is maintained, and a second state in which one rigid part performs a folding behavior with respect to the other rigid part of the two adjacent rigid parts between the first and second joint parts, the second state being reached when light is absorbed, and print patterns having different degrees of transparency are formed on a transparent high-molecular-weight polymer in the first and second joint parts, and thus a folding behavior is sequentially performed at the first and second joint parts due to different times taken to reach the second state through radiation of light according to degrees of transparency of the first and second joint parts.

Sequential joint behavior sheet using photo deformation and method of controlling folding and unfolding thereof

Disclosed herein is a deformation sensing flexible substrate using a pattern formed of a conductive material. The deformation sensing flexible substrate, using the pattern formed of the conductive material, includes a flexible substrate; and conductive patterns in which conductors including a conductive material are arranged and formed to be contactable and non-contact to each other based on deformation of the flexible substrate.

Deformation sensing flexible substrate using pattern formed of conductive material

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Seoul, South Korea

Maenghyo Cho