Arakawa Chemical Industries, Ltd.

Machio Chihara

Takashi Tanaka

Tatsuya Okumura

Jiro Mizuya

Mitsukazu Funahashi

A cleaning method for removing a rosin-base solder flux, the method including bringing a cleaning agent into contact with the flux on a printed wiring board, the cleaning agent including a mixture of

Method for cleaning rosin-base solder flux

The invention provides a cleaning method for removing a rosin-base solder flux, using essentially a mixture of

The invention provides a cleaning agent for removal of a rosin-base flux, the cleaning agent consisting essentially of a surfactant represented by the formula

Cleaning agent for rosin-base solder flux

A composition useful as an alkaline developable liquid photoimageable solder resist ink comprising a photocurable resin, a photopolymerization initiator, a reactive diluent, a solvent and optionally, a thermosetting material as main components wherein the photocurable resin comprises a reaction product of: (A) an epoxy vinyl ester resin obtained by reacting a cresol novolak epoxy resin and an unsaturated monobasic acid, (B) a polybasic acid anhydride and (C) an alkyl ketene dimer, wherein the hydroxyl value of the photocurable resin is not more than 10 carbons. Coating films formed from the subject composition have excellent adhesion, heat resistance, moisture insulation resistance and alkaline developable properties.

Growing community of inventors

Nara, Japan

Machio Chihara