Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Maarten Van Kampen

Vadim Yevgenyevich Banine

Erik Roelof Loopstra

Andrei Mikhailovich Yakunin

Harmen Klaas Van Der Schoot

Lucas Henricus Johannes Stevens

Andrey Alexandrovich Nikipelov

Jeroen Huijbregtse

Dirk Heinrich Ehm

Han-Kwang Nienhuys

Pieter-Jan Van Zwol

Hendrikus Gijsbertus Schimmel

Arjen Boogaard

Carlo Cornelis Maria Luijten

Stefan-Wolfgang Schmidt

Luigi Scaccabarozzi

Nicolaas Aldegonda Jan Maria Van Aerle

Marcel Johannus Elisabeth Hubertus Muitjens

Arthur Winfried Eduardus Minnaert

Alexey Sergeevich Kuznetsov

Alexander Marinus Arnoldus Huijberts

Pedro Julian Rizo Diago

Paulus Albertus Maria Gasseling

Hans Joerg Mallmann

Kurstat Bal

Saeedeh Farokhipoor

Rogier Verberk

Lucas Stevens

A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H, H, H, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.

Apparatus and method for cleaning an inspection system

A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Graphene spectral purity filter

A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device () arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material () arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.

Radiation system and optical device

Pellicle for reticle and multilayer mirror

A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.

Radiation source-collector and method for manufacture

There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Lithographic apparatus and method of manufacturing a device

A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

Lithographic apparatus and method

An arrangement for use in a projection exposure tool () for microlithography comprises a reflective optical element () and a radiation detector (). The reflective optical element () comprises a carrier element () guaranteeing the mechanical strength of the optical element () and a reflective coating () disposed on the carrier element () for reflecting a use radiation (). The carrier element () is made of a material which upon interaction with the use radiation () emits a secondary radiation () the wavelength of which differs from the wavelength of the use radiation (), and the radiation detector () is configured to detect the secondary radiation ().

Arrangement for use in a projection exposure tool for microlithography having a reflective optical element

Growing community of inventors

Eindhoven, Netherlands

Maarten Van Kampen