Asml Netherlands B.v.

Maarten Van Beijnum

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Raymond Wilhelmus Louis Lafarre

Martijn Houben

Antonius Franciscus Johannes De Groot

Jan Steven Christiaan Westerlaken

Adrianus Hendrik Koevoets

Jim Vincent Overkamp

Menno Fien

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Support apparatus, lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Maarten Van Beijnum