Asml Netherlands B.v.

Maarten Marinus Van Oene

Giovanni Luca Gattobigio

Jorge Alberto Vieyra Salas

Marcus Johannes Van Der Zanden

Ronald Frank Kox

Pieter Jeroen Johan Emanuel Hoefnagels

A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.

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Waalwijk, Netherlands

Maarten Marinus Van Oene