Asml Netherlands B.v.

Maarten Holtrust

Erik Henricus Egidius Catharina Eummelen

Frank Johannes Jacobus Van Boxtel

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Ferdy Migchelbrink

Han Henricus Aldegonda Lempens

Gheorghe Tanasa

Martinus Van Duijnhoven

Daan Daniel Johannes Antonius Van Sommeren

Miao Yu

Bart Dinand Paarhuis

Francis Fahrni

Petrus Martinus Gerardus Johannes Arts

Anne Willemijn Bertine Quist

Güneş Nak{dot Over (i)}boğlu

A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

Lithographic apparatus

A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

Cleaning device and method of cleaning

Growing community of inventors

Eindhoven, Netherlands

Maarten Holtrust