Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Maarten Hartger Kimman

Christiaan Alexander Hoogendam

Peter Michel Silvester Maria Heijmans

Sven Antoin Johan Hol

Olof Martinus Josephus Fischer

Dave Braaksma

Hans Butler

Johannes Petrus Martinus Bernardus Vermeulen

Jan Van Eijk

Yang-Shan Huang

Johannes Hubertus Antonius Van De Rijdt

Marcel Koenraad Marie Baggen

Peter Paul Hempenius

Antonie Hendrik Verweij

Niels Johannes Maria Bosch

Henricus Martinus Johannes Van De Groes

Jasper Wesselingh

Gerard Johannes Pieter Nijsse

Maarten Frans Janus Kremers

Robertus Jacobus Theodorus Van Kempen

Jeroen De Boeij

Eric Pierre-Yves Vennat

Michael Wilhelmus Theodorus Koot

Simon Bernardus Cornelis Maria Martens

Edwin Van Horne

Johannes Marinus Maria Rovers

Theodorus Mattheus Joannus Maria Huizinga

Wei Zhou

An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pmin a first direction and a pitch Pmin a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio Rof a coil pitch Pcin the first coil set in the first direction over Pmis different from a ratio Rof a coil pitch Pcin the second coil set in the second direction over Pm

Multiphase linear motor, multiphase planar motor, stage, lithographic apparatus and device manufacturing method

An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

Substrate positioning device and electron beam inspection tool

An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pmin a first direction and a pitch Pmin a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio R1 of a coil pitch Pcin the first coil set in the first direction over Pmis different from a ratio R2 of a coil pitch Pcin the second coil set in the second direction over Pm

The present invention provides a tubular linear actuator, comprising: a tubular coil assembly comprising multiple tubular coils arranged next to each other in longitudinal direction of the tubular linear actuator and concentric with respect to a longitudinal axis of the tubular linear actuator, and a magnet assembly comprising a series of permanent magnets with alternating polarization direction extending in the longitudinal direction, wherein the magnet assembly is at least partially arranged in the coil assembly and movably with respect to the coil assembly, wherein the tubular coils comprise edge windings.

Tubular linear actuator, patterning device masking device and lithographic apparatus

A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.

Positioning system for a lithographic apparatus

The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator. The magnetic gravity compensator comprises: a first permanent magnet assembly mounted to one of the first part and the second part and comprising at least a first column of permanent magnets, the first column extending in the vertical direction, wherein the permanent magnets have a polarization direction in a first horizontal direction or in a second horizontal direction opposite to the first horizontal direction, wherein vertically adjacent permanent magnets have opposite polarization directions, a second permanent magnet assembly mounted to the other of the first part and the second part and comprising at least one other column of permanent magnets, the at least one other column extending in the vertical direction, wherein vertically adjacent permanent magnets of the at least one other column have opposite polarization directions in the first horizontal direction or the second horizontal direction, wherein the first permanent magnet assembly at least partially encloses the second permanent magnet assembly.

Bearing device, magnetic gravity compensator, vibration isolation system, lithographic apparatus, and method to control a gravity compensator having a negative stiffness

An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction.

Electromagnetic actuator, stage apparatus and lithographic apparatus

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Veldhoven, Netherlands

Maarten Hartger Kimman