Asml Netherlands B.v.

Maaike Van T Westeinde

Patricius Aloysius Jacobus Tinnemans

Franciscus Godefridus Casper Bijnen

Hakki Ergün Cekli

Edo Maria Hulsebos

Ralph Brinkhof

Henricus Johannes Lambertus Megens

Maikel Robert Goosen

Weitian Kou

Willem Seine Christian Roelofs

Hadi Yagubizade

Loek Johannes Petrus Verhees

Wendy Johanna Martina Van De Ven

Manouk Rijpstra

Matthijs Cox

Ahmet Koray Erdamar

Tran Thanh Thuy Vu

Hakki Ergun Cekli

A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

Lithographic method

Growing community of inventors

Veldhoven, Netherlands

Maaike Van T Westeinde