Asml Netherlands B.v.

Ma Su Su Hlaing

Pieter Gerardus Jacobus Smorenberg

Putra Saputra

Theo Wilhelmus Maria Thijssen

Paul Derwin

Rowin Meijerink

Khalid Elbattay

Masaya Komatsu

Bo Zhong

A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.

Sub-field control of a lithographic process and associated apparatus

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Eindhoven, Netherlands

Ma Su Su Hlaing