Clariant Finance (bvi) Limited

Hoechst Celanese Corporation

Az Electronic Materials USA Corp.

Az Electronic Materials (luxembourg) S.a.r.l.

Merck Patent Gmbh

Clariant International Ltd

M Dalil Rahman

Daniel P Aubin

Douglas S McKenzie

Dana L Durham

Munirathna Padmanaban

Ralph R Dammel

Dinesh N Khanna

Ping-Hung Lu

Clement Anyadiegwu

Huirong Yao

Takanori Kudo

JoonYeon Cho

Sunit S Dixit

Francis Michael Houlihan

Stanley F Wanat

Michelle M Cook

David J Abdallah

David L Rentkiewicz

Salem K Mullen

SangHo Lee

Guanyang Lin

Jianhui Shan

Ruzhi Zhang

Shuji Ding

Elizabeth Wolfer

Allen G Timko

Hengpeng Wu

Mark O Neisser

Joseph E Oberlander

Takashi Sekito

Srinivasan Chakrapani

John C Saukaitis

PingHung Lu

Alberto D Dioses

Iain McCulloch

Andrew R Romano

WooKyu Kim

Woo-Kyu Kim

Venkata Gopal Reddy Chada

Philomen Z deCroos

Elaine G Kokinda

Anthony Canize

Karl Van Werden

Mohammad Khadim

Salem Mullen

Yi Yi

Carlo R Spilletti

Yi Yl

Rhuzi Zhang

Chi-Sun Hong

Zhong Xiang

Balaji Narasimhan

Ping H Lu

Robert E Potvin

John J Kokoszka

Douglas Mckenzie

Joonyeon Cho

The disclosed subject matter relates to a rinse and methods of use thereof for removing an edge protection layer and residual hardmask components (e.g., metals) from the edge and at least one proximate surface of a wafer/substrate where the rinse includes acetic acid and/or a halogenated acetic acid of structure (A) wherein Rand Rare independently hydrogen or a halogen and Ris a halogen and (ii) a compound having structure (B) wherein each of R, R, R, R, R, R, Rand Rh may independently be hydrogen, a substituted or an unsubstituted alkyl group, a substituted or an unsubstituted halogenated alkyl group, a substituted or an unsubstituted alkyl carbonyl group, a halogen, and a hydroxy group.

Rinse and method of use thereof for removing edge protection layers and residual metal hardmask components

The present invention relates to a composition comprising; components a) b) and d); wherein, component a) is a metal compound having the structure (I), component b) is a spin on high carbon polymer, having a polymer backbone comprising mono-cyclic aromatic hydrocarbon, fused-ring ring hydrocarbon moieties, or mixtures of these, having a wt. % of carbon from about 81 wt. % to about 94 wt. %, which is soluble to at least about 5 wt. % in a spin casting solvent, and wherein at least one, of said mono-cyclic aromatic hydrocarbon or said fused-ring ring hydrocarbon moieties, present in said spin on high carbon polymer, is functionalized with at least one alkynyloxy moiety of structure (VIII), and component d) is a spin casting solvent. The present invention further relates to using this composition in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma.

Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life

A coating composition, and uses thereof, including a solvent, metal oxide nanoparticles dispersed in this solvent, and a high carbon polymer dissolved in this solvent, where the high carbon polymer includes a repeat unit of structure (1), a hydroxybiphenyl repeat unit of structure (2) and a moiety containing a fused aromatic containing moiety of structure (3) where Rand Rare independently selected from the group of hydrogen, an alkyl and a substituted alkyl, Ar is an unsubstituted or substituted fused aromatic ring and Xis an alkylene spacer, or a direct valence bound. 

Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer

The present invention relates to a composition comprising; components a. c. and d; and optional component b. wherein, component a. is a metal compound having the structure (I), optional component b., is a polyol additive, having structure (VI), component c. is a high performance polymer additive, and component d. is a solvent. The present invention further relates to using this compositions in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma. 

Spin-on inorganic oxide containing composition useful as hard masks and filling materials with improved thermal stability

Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.

Materials containing metal oxides, processes for making same, and processes for using same

The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.

Stable metal compounds, their compositions and methods

The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R)(R) methylene moiety where Rand Rare independently H, C-Calkyl, C-Ccycloalkyl or C-Caryl; Ar, Ar, Arand Arare independently phenylenic and naphthalenic moiety, Rand Rare independently hydrogen or C-Calkyl; and Rand Rare independently hydrogen or C-Calkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating compositions and processes thereof

The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions.

Spin-on compositions of soluble metal oxide carboxylates and methods of their use

The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where Ris C-Calkyl, Ris C-Calkyl, Rand Rare independently hydrogen or C-Calkyl, and Ar' and Ar&#x2033; are independently phenylenic, or naphthalenic derived moieties, Rand Rare independently &#x2014;OH or &#x2014;(CH)OH where n=2-4, and Rand Rare independently hydrogen or C-Calkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R', R&#x2033;and R&#x2032;&#x2033;are independently hydrogen or a C-Calkyl. The invention further relates to a process for forming an image using the composition.

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):A-B&#x2003;&#x2003;(1)where A is a fused aromatic ring and B has a structure (2), where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.

Antireflective coating composition comprising fused aromatic rings

The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, Rto Rare independently selected from hydrogen and C-Calkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.

Antireflective coating composition

The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where Rto Ris independently selected from H and C-Calkyl, R' and R&#x2033; is independently selected from H and C-Calkyl, X is C-Calkylene, Y is C-Calkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

The present application relates to a compound of formula A-X&#x2014;B, where (i) A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii) A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Photoactive compounds

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Flemington, NJ, United States of America

M Dalil Rahman