Asml Netherlands B.v.

Lukasz Sosniak

Engelbertus Antonius Fransiscus Van Der Pasch

Frank Johannes Jacobus Van Boxtel

Günes Nakiboglu

Suzanne Johanna Antonetta Geertruda Cosijns

Anne Willemijn Bertine Quist

A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

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Diepenbeek, Netherlands

Lukasz Sosniak