Evonik Roehm Gmbh

Basf Se Corporation

Max-planck-gesellschaft Zur F&#xf6;rderung Der Wissenschaften E. V.

Evonik Rohm Gmbh

Lukas Friedrich Doessel

Werner Hoess

Reiner Mueller

Dominic Stoerkle

Klaus Muellen

Matthias Georg Schwab

Xinliang Feng

Michael Enders

Claude Guenanten

Victor Khrenov

Julian Klitsch

Karsten Postert

The invention relates to an impact-modified molding composition, especially impact-modified PMMA, having an improved profile of properties, especially also at elevated temperatures, to molded articles obtainable therefrom and to the use of the molding composition and the molded article.

Impact-resistant molding material having an improved characteristics profile

The present invention relates to novel matt PMMA foils for application on materials as foil providing protection from weathering effects and as decorative foil. In particular, the present invention relates to a novel, at least two-layer PMMA foil which features particularly good adhesion on the substrate. The outer layer here exhibits the mattness, and the inner layer here comprises a low-molecular-weight component which improves adhesion on the substrate.

Co-extruded impact-modified PMMA film

The invention relates to a molding composition modified for impact resistance, in particular to impact-resistant PMMA with improved optical properties at elevated temperatures, to molded items obtainable therefrom, and also to the use of the molding composition and of the molded items.

PMMA provided with impact resistance and having improved optical properties

Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R, Rare each H, halogen, &#x2014;OH, &#x2014;NH, &#x2014;CN, &#x2014;NOor a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), &#x2014;OH, &#x2014;NH, &#x2014;CN, and/or &#x2014;NO, where one or more CHgroups may also be replaced by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;C(O)O&#x2014;, &#x2014;O&#x2014;C(O)&#x2014;, &#x2014;C(O)&#x2014;, &#x2014;NH&#x2014; or &#x2014;NR&#x2014;, in which R is an optionally substituted CC-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical. 

Graphene nanoribbon precursors and monomers suitable for preparation thereof

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Darmstadt, Germany

Lukas Friedrich Doessel