Nanotek Instruments, Inc.

Lucy Fu

Bor Z Jang

Aruna Zhamu

Yanbo Wang

Mingchao Wang

A process for producing a highly oriented graphene film, comprising: (a) preparing a pristine graphene dispersion having oxygen-free pristine graphene sheets dispersed in a fluid medium; (b) dispensing and depositing the dispersion onto a supporting substrate to form a layer of oriented pristine graphene, including subjecting the pristine graphene dispersion to an orientation-inducing stress; (c) removing the fluid medium to form a dried layer of pristine graphene; (d) stacking at least two layers of dried pristine graphene to form a mass of multiple layers of dried pristine graphene; and (e) heat treating the mass of multiple layers of dried pristine graphene at a first heat treatment temperature higher than 2,000&#xb0; C. under a compressive stress for a sufficient period of time to produce the highly oriented graphene film.

Process for producing highly oriented graphene films

A process for producing a highly oriented graphene film (HOGF), comprising: (a) preparing a graphene oxide (GO) dispersion having GO sheets dispersed in a fluid medium; (b) dispensing and depositing the dispersion onto a surface of a supporting substrate to form a layer of GO, wherein the dispensing and depositing procedure includes subjecting the dispersion to an orientation-inducing stress; (c) removing the fluid medium to form a dried layer of GO having an inter-plane spacing dof 0.4 nm to 1.2 nm; (d) slicing the dried layer of GO into multiple pieces of dried GO and stacking at least two pieces of dried GO to form a mass of multiple pieces of GO; and (f) heat treating the mass under an optional first compressive stress to produce the HOGF at a first heat treatment temperature higher than 100&#xb0; C. to an extent that an inter-plane spacing dis decreased to a value less than 0.4 nm.

A process for producing a bulk highly oriented graphene structure, comprising: (a) preparing a graphene oxide dispersion having graphene oxide (GO) sheets dispersed in a fluid medium; (b) dispensing and depositing the dispersion onto a surface of a supporting substrate to form a layer of GO, wherein the dispensing and depositing procedure includes subjecting the dispersion to an orientation-inducing stress; (c) removing the fluid medium to form a dried layer of GO having an inter-plane spacing dof 0.4 nm to 1.2 nm; (d) slicing the dried layer of GO into multiple pieces of dried GO and stacking at least two pieces of dried GO to form a mass of multiple pieces of GO; and (f) heat treating the mass under an optional first compressive stress to produce the highly oriented graphene structure at a first heat treatment temperature higher than 100&#xb0; C. to an extent that an inter-plane spacing dis decreased to a value less than 0.4 nm.

Highly oriented graphene structures and process for producing same

A process for producing a unitary graphene material, comprising: (a) preparing a graphene oxide (GO) gel having GO molecules dissolved in a fluid medium wherein the GO molecules contain higher than 20% by weight of oxygen; (b) dispensing and depositing a layer of GO gel onto a surface of a substrate to form a layer of deposited GO gel thereon, wherein the dispensing and depositing procedure includes shear-induced thinning; (c) removing the fluid medium from the deposited GO gel to form a GO layer having an inter-plane spacing dof 0.4 nm to 1.2 nm as determined by X-ray diffraction; and (d) heat treating the GO layer to form the unitary graphene material at a heat treatment temperature higher than 100&#xb0; C. to an extent that dis decreased to a value of 0.3354 nm to 0.4 nm and the oxygen content is decreased to less than 5% by weight.

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Centerville, OH, United States of America

Lucy Fu