Asml Netherlands B.v.

Lucas Kuindersma

Hans Butler

Niels Johannes Maria Bosch

Michael Johannes Christiaan Ronde

Marc Wilhelmus Maria Van Der Wijst

Cornelius Adrianus Lambertus De Hoon

Johannes Hubertus Antonius Van De Rijdt

Marcel Koenraad Marie Baggen

Peter Paul Hempenius

Albertus Victor Gerardus Mangnus

Maikel Robert Goosen

Sander Kerssemakers

Henricus Martinus Johannes Van De Groes

Antonius Henricus Arends

Robertus Jacobus Theodorus Van Kempen

Thijs Verhees

Kuo-Feng Tseng

Embodiments consistent with the disclosure herein include methods for image enhancement for a multi-beam charged-particle inspection system. Systems and methods consistent with the present disclosure include analyzing signal information representative of first and second images, wherein the first image is associated with a first beam of a set of beams and the second image is associated with a second beam of the set of beams; detecting, based on the analysis, disturbances in positioning of the first and second beams in relation to a sample; obtaining an image of the sample using the signal information of the first and second beams; and correcting the image of the sample using the identified disturbances.

Systems and methods for image enhancement for a multi-beam charged-particle inspection system

An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

Electron beam inspection apparatus stage positioning

An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

Lithographic apparatus and device manufacturing method

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Veldhoven, Netherlands

Lucas Kuindersma