Asml Netherlands B.v.

Lucas Henricus Johannes Stevens

Vadim Yevgenyevich Banine

Johannes Hubertus Josephina Moors

Erik Roelof Loopstra

Levinus Pieter Bakker

Harmen Klaas Van Der Schoot

Andrei Mikhailovich Yakunin

Maarten Van Kampen

Ralph Kurt

Bastiaan Theodoor Wolschrijn

Dirk Willem Harberts

Johannes Adrianus Cornelis Maria Pijnenburg

Peter Cornelis Zalm

Johannes Peterus Henricus De Kuster

Laura Maria Fernandez Diaz

Nicolaas Ten Kate

Maarten Marinus Johannes Wilhelmus Van Herpen

Wouter Anthon Soer

Thomas Poiesz

Abraham Alexander Soethoudt

Jimmy Matheus Wilhelmus Van De Winkel

Bert Dirk Scholten

Thomas Stein

Kurt Gielissen

Yurii Victorovitch Sidelnikov

Wilhelmus Jacobus Johannes Welters

Marc Hubertus Lorenz Van Der Velden

Sjoerd Nicolaas Lambertus Donders

Martinus Hendrikus Antonius Leenders

Arno Jan Bleeker

Sander Frederik Wuister

Michel Riepen

Pieter Willem Herman De Jager

Marcel Mathijs Theodore Marie Dierichs

Johannes Onvlee

Frank Jeroen Pieter Schuurmans

Nina Vladimirovna Dziomkina

Ronald Van Der Ham

Ruud Antonius Catharina Maria Beerens

Vladimir Mihailovitch Krivtsun

Olav Waldemar Vladimir Frijns

Konstantin Nikolaevitch Koshelev

Anastasius Jacobus Anicetus Bruinsma

Hans Meiling

Marius Ravensbergen

Koen Gerhardus Winkels

Erik René Kieft

Vladimir Vital'Evitch Ivanov

Nikolay Nikolaevich Iosad

Robert Rafilevitch Gayazov

Edwin Johannes Cornelis Bos

Egbert Anne Martijn Brouwer

Abraham Veefkind

George Alois Leonie Leenknegt

Dennis Dominic Van Der Voort

Peter Gerhardus Wihelmus Bussink

Yurii Victorovitch Sidelkov

Vsevolod Grigorevitch Koloshnikov

Yurii Victorvitch Sidelnikov

Erik Rene Kieft

Vladimir Vital'evitch Ivanov

A substrate support configured to support a substrate. The substrate support has a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support has a liquid supply channel configured to supply a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, to allow charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.

Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate

A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

Lithographic apparatus and a device manufacturing method

A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.

System, a lithographic apparatus, and a method for reducing oxidation or removing oxide on a substrate support

A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Graphene spectral purity filter

Pellicle for reticle and multilayer mirror

In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Lithographic apparatus, programmable patterning device and lithographic method

A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

Lithographic apparatus and method

Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.

Inspection apparatus and method

A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

Lithographic apparatus and contamination detection method

A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

System and method for detecting at least one contamination species in a lithographic apparatus

The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.

Lithographic apparatus and device manufacturing method

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Lucas Henricus Johannes Stevens