Richemont International S.a.

Tronic's Microsystems

Tronics Microsystems S.a.

Luca Ribetto

Christophe Kergueris

Alexis Heraud

Béatrice Wenk

Jean-Charles Fiaccabrino

Susana Del Carmen Tobenas Borron

Vincent Gaff

Pierre-Marie Visse

Nelly Socquet

Susana Tobenas

Ricardo Signoretti

A method for manufacturing a plurality of mechanical resonators () in a manufacturing wafer (), the resonators being intended to be fitted to an adjusting member of a timepiece, the method comprising the following steps: (a) manufacturing a plurality of resonators in at least one reference wafer according to reference specifications, such manufacture comprising at least one lithography step to form patterns of the resonators on or above the reference wafer and a step of machining in the reference plate using the patterns; (b) for the at least one reference plate, establishing a map indicative of the dispersion of stiffnesses of the resonators relative to an average stiffness value; (c) dividing the map into fields and determining a correction to be made to the dimensions of the resonators for at least one of the fields in order to reduce the dispersion; (d) modifying the reference specifications for the lithography step so as to make the corrections to the dimensions for the at least one field in the lithography step; (e) manufacturing resonators in a manufacturing wafer using the modified specifications.

Method for manufacturing a plurality of resonators in a wafer

A mechanical oscillator endowed with a strip, with the aforesaid strip incorporating a first silicon layer having a crystal lattice extending along a first direction of one plane, a thermal compensation layer composed of a material having a Young's modulus thermal coefficient of opposite sign to that of the silicon, and a second silicon layer having a crystal lattice extending in a second direction of the plane, with the first and direction being offset at an angle of 45&#xb0; within the plane of the layers, and with the thermal compensation layer extending between the first and second silicon layers.

Mechanical oscillator and associated production method

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Voiron, France

Luca Ribetto