Forschungsverbund Berlin E.v.

Luca Redaelli

Michael A Kneissl

Sven Einfeldt

A method is described for forming at least one metal contact on a surface of a semiconductor and a device with at least one metal contact. The method is used for forming at least one metal contact () on a surface () of a semiconductor () and has the steps of: applying a metal layer () of palladium onto the semiconductor surface (), applying a mask () onto the metal layer (), and structuring the palladium of the metal layer () using the mask (), wherein lateral deposits () of the metal are formed on sidewalls of the mask by the structuring so that the mask is embedded between the deposits () and the structured metal layer (') after the structuring. Since the mask is conductive, it can remain embedded in the metal. The deposits and the mask form a part of the contact.

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Berlin, Germany

Luca Redaelli