Asml Netherlands B.v.

Asml Holding N.v.

Lowell Lane Baker

Frank Johannes Jacobus Van Boxtel

Ruud Hendrikus Martinus Johannes Bloks

Hakki Ergün Cekli

Christopher Charles Ward

Laurentius Johannes Adrianus Van Bokhoven

Jean-Philippe Xavier Van Damme

Geoffrey Alan Schultz

Bearrach Moest

Daniel Nathan Burbank

James Robert Downes

Ronald Peter Albright

Hermen Folken Pen

Güneş Nakíboglu

Wijnand Hoitinga

Güneş Nak{dot Over (i)}boglu

An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.

Lithographic apparatus and device manufacturing method

A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Patterning device cooling apparatus

Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.

Membrane assembly and particle trap

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Norwalk, CT, United States of America

Lowell Lane Baker