Varian Semiconductor Equipment Associates, Inc.

Louis Steen

Ludovic Godet

Deepak Arabagatte Ramappa

Christopher R Hatem

Yuri Erokhin

Hans-Joachin Ludwig Gossmann

A surface of an insulating workpiece is implanted to form either hydrophobic or hydrophilic implanted regions. A conductive coating is deposited on the workpiece. The coating may be a polymer in one instance. This coating preferentially forms either on the implanted regions if these implanted regions are hydrophilic or on the non-implanted regions if the implanted regions are hydrophobic.

Plasma processing of workpieces to form a coating

An improved method of doping a workpiece is disclosed. In this method, a film comprising the species to be implanted is introduced to the surface of a planar or three-dimensional workpiece. This film can be grown using CVD, a bath or other means. The workpiece with the film is then subjected to ion bombardment to help drive the dopant into the workpiece. This ion bombardment is performed at elevated temperatures to reduce crystal damage and create a more abrupt doped region.

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Atkinson, NH, United States of America

Louis Steen