Lumera Corporation

Louis J Bintz

Raluca Dinu

Danliang Jin

Jeffrey K Kressbach

A method including poling an optical waveguide device including an optical waveguide core, an electrode, and an organically modified sol-gel layer.

Electro-optic polymer waveguide devices incorporating organically modified sol-gel clads

Electro-optic waveguide devices that comprise an electro-optic polymer core and a polymer buffer clad. The polymer buffer clad comprises an organically modified sol-gel and has a refractive index lower than the refractive index of the core.

A device that comprises: a) a first optical waveguide; b) a second optical waveguide; c) an optical coupling region including the first and second optical waveguides, the optical coupling region characterized as having at least one coupling length and comprising a first bias section, a modulation section, and a second bias section arranged such that light propagates serially through the first bias section, the modulation section, and the second bias section; d) a first bias electrode for biasing the first bias section; e) a modulating electrode for applying a modulating voltage to the modulation section, the modulating electrode being positioned to control the refractive index of the first optical waveguide; and f) a second bias electrode for biasing the second bias section.

Linear optical modulators and method of linear optical modulation

An electro-optic waveguide device that includes (a) an electro-optic polymer core having a refractive index and (b) an electro-optic first polymer clad in proximity to the electro-optic polymer core. The electro-optic first polymer clad having a refractive index that is lower than the refractive index of the electro-optic polymer core

Polymer waveguide devices incorporating electro-optically active polymer clads

A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.

Method for manufacturing polymer microstructures and polymer waveguides

An electro-optic waveguide device, comprising (a) a first polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 &#x3bc;m to about 3.2 &#x3bc;m; (b) a first polymer clad having a refractive index of about 1.53 to about 1.61 and a thickness of about 1.0 &#x3bc;m to about 3.0 &#x3bc;m; (c) an electro-optic polymer core having a refractive index of about 1.54 to about 1.62 and a thickness of about 1.0 &#x3bc;m to about 3.0 &#x3bc;m; and (d) a second polymer buffer clad having a refractive index of about 1.445 to about 1.505 and a thickness of about 2.2 &#x3bc;m to about 3.2 &#x3bc;m.

Growing community of inventors

Bothell, WA, United States of America

Louis J Bintz