Commissariat a L'energie Atomique

Sanofi

Ciba-geigy Corporation

Centre National De La Recherche Scientifique

Merck Patent Gmbh

Virbac Corporation

Virbac Sa

Louis Giral

Francois Schue

Marie-Laure Ancelin

Francois Buiguez

Michele Calas

Charles Rosilio

Henri Vial

Marc Puygrenier

Jacques Bompart

Jacques Cavezzan

Christian Prud'Homme

Jean-Jacques Bourguignon

Denis Jerome

Claude More

Klaus Bechgaard

Guy-Roland Roger

Michel Ribault

Valerie Sailhan

Andre Fournel

Rosy Eloy

Jean-Marc Delrieu

Francedillaois Schue

Sylvianne Dumas

Jean M Fabre

Jean-Pierre Sorbier

The invention concerns pharmaceutical compositions with antimalaria and antibabesiosis activity, the active substances of these compositions and their use for formulating antimalaria drugs.

Antimalaria and antibabesiosis agents and pharmaceutical compositions

A process for the preparation of a highly pure alkyl 2-cyanoacrylate, wherein alkyl has 1-10 C atoms, characterized in that

Highly pure alkyl 2-cyanoacrylates

Bis(2-aminopyridine)s, preparation method therefor and use thereof for

Substrates, e.g., silicon wafers, coated with a UV-curable organopolysiloxane composition including a crosslinking catalyst therefor (e.g., a platinum group metal compound) and an amount of a crosslinking inhibitor (e.g., an azodicarboxylate) which is effective at ambient temperature, but ineffective to prevent crosslinking on exposure of the composition to ultraviolet radiation, are well adapted for the imaging of negative intelligence patterns thereon.

UV-curable organopolysiloxane compositions and negative photoresists

Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.

Silicon-containing polymer and its use as a masking resin in a

Thienopyridinone derivatives of the general formula: ##STR1## in which Y represents hydrogen or a lower alkyl group and X represents: a hydroxy, lower alkanoyloxy, lower alkoxy unsubstituted or substituted by a hydroxy, lower alkoxy, di-(lower alkyl)-amino, piperidino, pyrrolidino, morpholino or N-(lower alkyl)-piperazino group,

Intermediates for anti-bacterial thienopyridinones

Photosensitive film based on silicon-containing polymer and its use as a

Thienopyridinone derivatives and anti-bacterial compositions containing

Method of increasing the supraconductive critical temperature in quasi

Growing community of inventors

Montpellier, France

Louis Giral