Basf Se Corporation

Lothar Engelbrecht

Clemens Auschra

Ralf Knischka

Frank O Pirrung

Reiner Kranwetvogel

Szilard Csihony

Daniel Loeffler

Wolfgang Peter

Yeni Burk

Marcel Brill

Mary Thomson

Andreas Klipp

Volodymyr Boyko

Andreas Gernandt

Frank Pirrung

Patrick Wilke

Mei Chin Shen

Sheng Hsuan Wei

Maike Bergeler

Jens-Uwe Voigt

Reinier Kranwetvogel

The invention relates to the use of a composition comprising a Cto Calkanol and a carboxylic acid ester of formula (I) wherein Ris selected from a Cto Calkyl, which may be unsubstituted or substituted by OH or F, and —X—[O—X]—H; Ris selected from a Cto Calkyl, which may be unsubstituted or substituted by OH or F, and —X—[O—X]—H; X, Xare independently selected from Cto Calkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the Cto Calkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture.

Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives.

Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH&#x2014; terminated oligo- or polyalkylene ethers in the presence of the tetra-n-C-C-alkoxy-titanate as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.

Process for preparing polyalkylene ether-modified polysiloxanes and use thereof

The invention relates to a process for preparing oligo- or polyalkylene ether-modified polysiloxanes by transesterification of alkoxy-functionalized polysiloxanes with OH-terminated oligo- or polyalkylene ethers in the presence of an alkanesulfonic acid as catalyst. Oligo- or polyalkylene ether-modified polydimethylsiloxanes obtainable through this process are suitable as defoamers, as wetting agents, and as additives in coating material formulations.

The present invention relates to aqueous polymer-silicon oil hybrid compositions in the form of aqueous dispersions of finely divided polymer-silicon oil hybrid particles which comprise at least one water-insoluble polymer P made of ethylenically unsaturated monomers M, at least one surface-active substance and at least non-polymerizable, non-polar silicon oil. The present invention relates in particular to the use of these compositions as additives in aqueous coating and printing ink compositions.

Aqueous polymer-silicon oil hybrid composition

The present invention relates to novel block copolymers of general formula (I). The invention further relates to a method for producing such block copolymers and to the use of such block copolymers, particularly as additives in liquid coating-agent compositions. A{X&#x2014;[O&#x2014;C(O)NH&#x2014;Y&#x2014;NH&#x2014;C(O)&#x2014;O-M-B]}n (I). In formula (I), the variables have the following meanings: n is a number in the range from 1 to 40 or 2 to 40, particularly 1 to 10 or 2 to 10 and especially 2 to 5; k is 1 or 2; A is a poly(dimethylsiloxane) block; B is a polymer block constructed of ethylenically unsaturated monomers, which optionally comprises a terminal group different from hydrogen; X is a bivalent or trivalent group having 2 to 20 C atoms, which is saturated or unsaturated and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and halogen; Y is a bivalent hydrocarbon group having 2 to 20 C atoms, which is saturated or unsaturated, and M is a chemical bond or C2-C10 alkylene, which can be interrupted by one or two groups not directly adjacent, selected from among O, C(&#x2550;O)O, and (C&#x2550;O)NH and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and phenyl.

Block copolymers having a polydimethylsiloxane block

The present invention relates to a composition, comprising

Method to lower the dynamic surface tension of a composition

The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): HC&#x2550;C(R)(C(0)OR), wherein R1 is H or methyl; and Ris an organic residue containing a perfluorinated Calkyl group, a fluorinated alpha-olefin having the following formula (II): HC&#x2550;CH(R) (II) wherein Ris an organic residue containing a perfluorinated Calkyl group, i.e. &#x2014;(CF)&#x2014;CFor any mixture thereof.

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Berlin, Germany

Lothar Engelbrecht