Industrial Technology Research Institute

National Taiwan University

National Applied Research Laboratories

Lon A Wang

Yung-Pin Chen

Jer-Haur Chang

Chang-Ming Dai

Ren-Young Liu

Shuo-Hung Chang

Tz-Shiuan Peng

Chih-Sheng Jao

I-Jong Wang

Pin-Chung Lin

Jian-Hong Chen

Shih-Min Chuo

Tz Shiuan Peng

Yuet-Ping Lee

H L Chen

Hl Chen

A system and a method for monitoring change of intraocular pressure and a contact lens for sensing change of intraocular pressure are provided. The contact lens includes a first material layer and a first pattern. The center of the first material layer has an optical region, and the optical region corresponds to a cornea region of an eyeball. The first pattern is formed on the optical region. Furthermore, the contact lens may further include a second material layer and a second pattern. The second material layer is located on the first material layer. The second pattern is formed on the second material layer and overlaps with the first pattern to form a moire pattern.

System and method for monitoring change of intraocular pressure and contact lens for sensing change of intraocular pressure

An optical fiber apparatus is suitable to operate under irradiation, more particularly to mitigating the damage of a rare-earth-doped optical fiber element as part of an optical fiber assembly causes by irradiation. The irradiation mitigation attributes to a photo-annealing apparatus including at least a shorter wavelength photo-annealing spectral content, which is relative to that of a pump light source, for effectively photo-annealing the rare-earth-doped fiber element. Photo-annealing by such shorter wavelength light results in a fast and nearly complete recovery of radiation induced attenuation of the rare-earth-doped optical fiber element in the wavelength range from 900 nm to 1700 nm.

Shorter wavelength photo-annealing apparatus for rare-earth-doped fiber and its optical assemblies under irradiation

A feedback light tuning device and the optical communication system and method using the same are provided. By tuning the feedback light, the mechanism can completely correct the mean-wavelength drift up to 30 nm or 19400 ppm. The mechanism can be applied to various harsh environments which cause the mean-wavelength drift, so as to achieve a required stable mean-wavelength for the light source and to increase the acceptable range of radiation dose.

Feedback light tuning device and optical communication system and method using the same

The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Method and apparatus for generating periodic patterns by step-and-align interference lithography

A nano/micro-patterned optical device includes a soft film substrate and nano/micro thin wires. A surface of the soft film substrate includes a nano/micro-pattern formed through a lithography process, and the nano/micro-pattern includes a plurality of depressed grooves. The nano/micro thin wires are placed in the depressed grooves, and used to form a plurality of optical waveguides, in which the optical waveguides include at least one optical coupling region, and the optical coupling region is located on a joining position of the optical waveguides. A fabrication method of the nano/micro-patterned optical device is also provided.

Nano/micro-patterned optical device and fabrication method thereof

Disclosed is a method of micro/nano imprinting, which applies soft mold, pre-shaping sealing film, and soft holder arrangements to the micro/nano structure imprinting process of the curved substrates. The method of the present invention can prevent the curved surface from crumbling, which may result from high gas pressuring, and can obtain uniform imprinting pressure distribution throughout the whole curved substrate. Moreover, replicating micro/nano structures onto double-sided curve, both convex and concave, surfaces can also be achieved.

Method of micro/nano imprinting

A half tone phase shift mask material, suitable for use at 193 nm is disclosed. It comprises a layer of nitrogen rich silicon nitride that was formed by subjecting a mixture of a nitrogen bearing gas, such as nitrogen and/or ammonia, with a silicon bearing gas, such as silane, to a plasma discharge. Provided the ratio of the nitrogen bearing to the silicon bearing gases is about 10 to 1, films having the required optical properties at 193 nm are formed. These properties are a reflectance that is less than 15% and a transmittance that is between 4 and 15%. Related optical properties, namely an extinction coefficient of about 0.4 and a refractive index of about 2.5, are also closely approached. Additionally, the films are stable under prolonged UV exposure and exhibit good etch behavior.

Growing community of inventors

Taipei, Taiwan

Lon A Wang