Credence Systems Corporation

Standard Microsystems Corporation

Verigy (singapore) Pte. Ltd.

Dcg Systems Gmbh

Lokesh Johri

Theodore R Lundquist

Saurabh Gupta

Martin Betz

Erwan Le Roy

William B Thompson

Patricia Le Coupanec

Mark Alan Thompson

Richard W Holbrook

Madhumita Sengupta

Hui Wang

Rajesh Kumar Jain

Ben Rogel-Favila

Tamal Basu

James Siebert

Dennis McCarty

Sasikala Divakaruni

Simon Voong

Andrew Bartlett

Kaushik Ghosh

Jagadish Narayana Gade

A method for transferring data between a host device and an external device is described. The external device has FAT32 file system. The method accepts parameters for an incoming data file from the host device. Further, the method allocates memory blocks for the incoming file data on the external device based on the parameters and indexes the allocated memory blocks on a memory index table to create a file footprint. The method reads the memory index table to identify the file footprint and receives the incoming file data from the host device.

Method and system for transferring data between a host device and an external device

A method and system generate a boundary of a Schmoo plot. In accord with the method, a plurality of seed points having a resolution that is less than or equal to &#xbd; the acquisition resolution indicated by a smoothness of a representative Schmoo boundary are selected. A coarse boundary search is performed to identify a plurality of test points that are within an acquisition resolution of the boundary. The test points that comprise the coarse boundary are interpolated to produce a fine estimate of the boundary.

Estimating boundaries of Schmoo plots

A method and apparatus for defining a circuit operation, such as a charged particle beam operation to perform a circuit edit and define a probe point. Circuit operation definition is performed in a front-end environment with access to integrated circuit computer aided design tools providing logic level and layout level information concerning the integrated circuit. The front-end environment incorporates circuit operation optimization methods to identify optimal locations for a circuit operation. A back-end environment, such as a charged particle tool computing platform, is adapted to receive one or more files, which may include a truncated layout file with circuit operation location information, for use in further defining a circuit operation and/or performing the circuit operation.

Apparatus and method for circuit operation definition

A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam generation unit, such as a focused ion beam (FIB) column, which emits a charged particle beam onto the DUT. Also included is a scan controller arrangement implementing a finite state machine to control the application of the charged particle beam onto the DUT according to a plurality of scanning control parameters. The scanning control parameters may describe one or more scan regions that are rectangular in shape. Further, the parameters may describe one or more scan regions describing other shapes by way of a bit-map. Similarly, a method for controlling the scanning of a charged particle beam that involves obtaining a set of scanning control parameters, and then directing the charged particle beam as specified by the scanning control parameters by way of a finite state machine, is disclosed.

Enhanced scanning control of charged particle beam systems

A method for utilizing interference fringe patterns generated when milling a trench through a semiconductor substrate by a method such as FIB milling, to determine and optimize the thickness uniformity of the trench bottom. The interference fringes may be mapped and the mapping used to direct the FIB milling to those regions which are thicker to correct observed non-uniformities in the trench floor thickness by varying the pixel dwell time across the milled area. The interference fringe mapping may be used to develop computerized contour lines to automate the pixel dwell time variations as described above, for correcting non-uniformities in the trench floor thickness. The method may be applied to applications other than trench formation for backside editing, such as monitoring progress in forming a milled object.

Method and apparatus for addressing thickness variations of a trench floor formed in a semiconductor substrate

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San Jose, CA, United States of America

Lokesh Johri