Canon Kabushiki Kaisha

Molecular Imprints, Inc.

Logan L Simpson

James W Irving

Niyaz Khusnatdinov

Craig William Cone

Wei Zhang

Steven Wayne Burns

Mario Johannes Meissl

Edward Brian Fletcher

Seth J Bamesberger

Van Nguyen Truskett

Xiaoming Lu

Amir Tavakkoli Kermani Ghariehali

Stephen C Johnson

John D Williamson

Matthew C Traub

Christopher Ellis Jones

Ecron D Thompson

Whitney Longsine

Brent Andrew Snyder

Daniel Ironside

Adam Shackleton

Jason Battin

A system and method for shaping a film on a partial field which may include determining a set of initial contact control values based on: a superset of calibration data; a desired initial contact point; and a partial field shape description. The system and Method may also include imprinting the partial field with the set of initial contact control values.

Method and system for determining initial contact control values for shaping partial fields and method and system for shaping partial fields

A performance monitor determines a performance characteristic of a plurality of dispensers receiving fluid from a reservoir. Each of the plurality of dispensers has an actuator that, when actuated, causes the each of the dispensers to generate a droplet of the fluid. A driver generates a drive command to the actuator to adjust a physical attribute of the droplet based on the performance characteristic to satisfy a performance criteria.

Method and apparatus to reduce variation of physical attribute of droplets using performance characteristic of dispensers

A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.

Fluid droplet methodology and apparatus for imprint lithography

A system and method for shaping a film on a partial field including determining an initial contact point. Receiving information about: a partial field of a substrate; and an edge of a patternable area of the substrate. Determining a chord that connects intersection vertices of the partial field and the edge. Determining coordinates of a bisecting line, wherein the bisecting line bisects the chord, and the bisecting line is orthogonal to the chord. Determining an initial contact point range on the bisecting line in which a template and formable material on the substrate contact each other. Contacting the formable material in the partial field on the substrate with the template at an initial contact point within the initial contact point range.

Method of determining the initial contact point for partial fields and method of shaping a surface

A fabrication method comprises selecting an initial drop pattern defining a position of drops of a formable material, the initial drop pattern comprising a grid pattern of drops, designating the drops of the grid pattern to be dispensed by a first series of nozzles of a dispenser based on a spacing between drops in the Y-dimension; generating a modified drop pattern by shifting the grid pattern in a first direction along the Y-dimension, wherein a shift distance is selected such that the drops of the shifted grid pattern are designated to be dispensed from a second series of nozzles of the dispenser; dispensing the plurality of drops according to the modified drop pattern onto a substrate; during the dispensing of the drops, shifting a position of the stage or dispenser along the Y-dimension opposite to the first direction by an amount equal to the shift distance.

Residual layer thickness compensation in nano-fabrication by modified drop pattern

One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.

Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern

A fluid dispenser apparatus includes a fluid dispenser having plurality of nozzles aligned in a first longitudinal direction. A dispenser shield is positioned relative to the plurality of nozzles, the dispenser shield configured to form an aperture aligned in the first longitudinal direction with the plurality of nozzles. The plurality of nozzles are configured to dispense fluid towards a substrate. The dispenser shield is further positioned such that fluid dispensed from a first subset of the plurality of nozzles passes through the aperture while fluid dispensed from a second subset of the plurality nozzles is captured by the dispenser shield.

Dispenser shield with adjustable aperture to improve drop placement and residual layer thickness

Systems and methods for calibrating a dispense head to provide substantially uniform droplets on a substrate are described.

Fluid dispense device calibration

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Coupland, TX, United States of America

Logan L Simpson