Asml Netherlands B.v.

Lodewijk Alexander Schijvenaars

Erik Roelof Loopstra

Engelbertus Antonius Fransiscus Van Der Pasch

Emiel Jozef Melanie Eussen

Ruud Antonius Catharina Maria Beerens

Tom Van Zutphen

Matthias Kruizinga

Jacob Willem Vink

Stefan Gertrud Marie Hendriks

Ron Geeraard Catharina De Bruijn

Kristof Custers

A pellicle frame includes: a first portion; and a plurality of second portions. The first portion is for connection to a border of a pellicle. The first portion includes a hollow and generally rectangular body. The plurality of second portions are for connection to a patterning device. The first portion and the plurality of second portions are all formed from a first material. Each of the second portions is connected to the first portion by a spring portion formed from the first material. Such a pellicle frame is advantageous since the first portion, the plurality of second portions and the spring portions are all formed from a same material.

Pellicle frame for EUV lithography

A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.

Lithographic apparatus and sensor calibration method

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Zevenbergschen Hoek, Netherlands

Lodewijk Alexander Schijvenaars