Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

The Ncs Testing Technology Co., Ltd.

Central Iron & Steel Research Institute Co., Ltd

Lizhi Ren

Yang Wang

Kun Li

Lei Zhao

Bin Wu

Haizhou Wang

Yunhai Jia

Xuejing Shen

Dongling Li

Xuequan Yu

Lixia Yang

Wenjun Shen

Zongxin Liu

Yadong Gao

Danqi Huang

Changwang Zhu

A component residual stress testing platform based on neutron diffraction and experimental method thereof are provided, the testing platform includes a component support, a rotating mainshaft, a first thrust cylindrical roller bearing, a first cylindrical roller bearing, a bearing spacing sleeve, a second cylindrical roller bearing, a sleeve, and a first fixed baffle. The rotating mainshaft is disposed on the component support. The first thrust cylindrical roller bearing, the first cylindrical roller bearing, the bearing spacing sleeve and the second cylindrical roller bearing are sleeved on the rotating mainshaft, the sleeve is sleeved outside the first cylindrical roller bearing, the bearing spacing sleeve and the second cylindrical roller bearing, a component to be tested is sleeved on the sleeve. The testing platform can support, move, tilt and rotate the component to be tested in a process of a residual stress testing.

Component residual stress testing platform based on neutron diffraction and experimental method thereof

An alignment exposure method and a method for fabricating a display substrate are disclosed. The alignment exposure method includes a first alignment exposure process and a second alignment exposure process. Multiple groups of alignment marks are provided at an edge of at least one side of the substrate in the first alignment exposure process. At least one group of mark structures are provided at an edge of at least one side of a mask employed in the second alignment exposure process. In multiple mask alignment processes in the second alignment exposure process, each group of the at least one group of the mark structures of the mask are aligned with groups of the alignment marks at a corresponding side of the substrate group by group. The alignment exposure method is employed to realize alignment exposure of a substrate with a size larger than a size of a mask.

Alignment exposure method and method of fabricating display substrate

Growing community of inventors

Beijing, China

Lizhi Ren