Shenzhen China Star Optoelectronics Technology Co., Ltd.

Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.

Liwang Song

Yong Xu

Zhaohui Li

The invention provides an array substrate and manufacturing method thereof. The array substrate comprises: a substrate; a plurality of data lines and scan lines disposed on one side of the substrate, the data lines and the scan lines defining a plurality of sub-pixel areas, the data lines and the scan lines being mutually insulated, the data lines extending in a first direction and being arranged in a second direction crossing the first direction, the scan lines extending in the second direction and being arranged in the first direction; a color-resist layer disposed on the same side of the substrate with the data lines and the scan lines, the color-resist layer comprising a plurality of color-resists, and two adjacent color-resists of the plurality of color-resists having an overlapping area corresponding to an area of a respective one of the data lines; a data black matrix (BM) saving (DBS) common electrode wire extending in the first direction and disposed on a side of the overlapping area of the color-resist layer away from the substrate to shield a data line of the plurality of data lines, and uniform slits disposed at an edge of the DBS common electrode wire in plan view, the uniform slits extending in the second direction and being arranged in the first direction.

Array substrate and manufacturing method thereof

A method for manufacturing the top-gated thin film transistors is disclosed and includes forming a first photoresist pattern with a first shielding portion and two second shielding portions, and etching a gate metal layer by adopting the first photoresist pattern as a mask. Thus, a size of the gate pattern coincides with a size of a channel region of a conductive channel, to increase a control force of a gate to the conductive channel, thereby improving performance of device.

Method for manufacturing top-gated thin film transistors

A liquid crystal panel includes a first substrate, a TFT layer located on the first substrate, a color resist layer located on the TFT layer, a photospacer layer located on the color resist layer, a protective layer located on the color resist layer and the photospacer layer, a via hole penetrating the color resist layer and the protective layer, a pixel electrode layer formed on the protective layer and electrically connected to the TFT layer with the via hole and a second substrate oppositely located to the first substrate, and one or more color resist material in the photospacer layer and the color resist layer are the same, and the photospacer layer and the color resist layer are formed at the same time during a manufacture process.

Liquid crystal panel and manufacture method thereof

A method for manufacturing an array substrate is provided. The array substrate, by providing a black matrix and a color resist layer on the array substrate and providing the color resist layer on the TFT layer, prevents bad influences on the color resist layer caused by a high temperature TFT process so as to provide a liquid crystal panel with improved displaying quality. The method includes, firstly, forming a black matrix on a substrate, and secondly, implementing a TFT manufacture process on the black matrix, and then forming a color resist layer after the TFT manufacture process. Accordingly, forming both the black matrix and the color resist layer on the array substrate can be achieved, where the color resist layer is formed after the TFT manufacture process to prevent bad phenomenon caused by the high temperature of the TFT process.

Array substrate and manufacture method thereof

A COA type liquid crystal display panel and a method for manufacturing the same are disclosed. The photoresist layer comprises a white, a red, a green, and a blue photoresist. The spacer layer is formed with at least one color of photoresists at the same time, and the material is the same. The photo spacer layer using photoresist as material of the prior art is eliminated. Thus the production requires less time and the efficiency is higher. The method comprises forming a photoresist layer composed of a white, a red, a green, and a blue photoresist on the TFT layer, and forming a spacer layer at the same time when forming the corresponding photoresist using at least one color of photoresist material. The manufacture process for making the photo spacer layer of the prior art is eliminated to save the mask, shorten the production time and increase the production efficiency.

COA type liquid crystal display panel and method for manufacturing the same

The present invention provides an array substrate and a manufacture method thereof. The array substrate, by locating both a black matrix and a color resist layer on the array substrate, and locating the color resist layer on the TFT layer prevents the bad influence to the color resist layer from the high temperature TFT process, and accordingly to make the liquid crystal panel with higher display quality. The manufacture method of the array substrate, first forms a black matrix on the substrate, and second implements TFT manufacture process on the black matrix, and then forms a color resist layer after the TFT manufacture. Accordingly, both the black matrix and the color resist layer manufactured on the array substrate can be achieved, and with forming the color resist layer after the TFT manufacture to prevent the bad phenomenon due to bubbles generated by the color resist volatilization from the high temperature TFT process, and accordingly to effectively make the liquid crystal panel with higher display quality and raise production yield.

The present invention provides a liquid crystal panel and a manufacture method thereof. The liquid crystal panel comprises: a first substrate (), a TFT layer () located on the first substrate (), a color resist layer () located on the TFT layer (), a photospacer layer () located on the color resist layer (), a protective layer () located on the color resist layer () and the photospacer layer (), a via hole () penetrating the color resist layer () and the protective layer (), a pixel electrode layer () formed on the protective layer () and electrically connected to the TFT layer () with the via hole () and a second substrate () oppositely located to the first substrate (), and one or more color resist material in the photospacer layer () and the color resist layer () are the same, and the photospacer layer () and the color resist layer () are formed at the same time during a manufacture process.

Growing community of inventors

Guangdong, China

Liwang Song