Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Boe Technology Group Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Liusong Ni

Liangchen Yan

Qinghe Wang

Wei Song

Yuankui Ding

Wei Li

Ming Hsi Wang

Ning Liu

Ce Zhao

Yingbin Hu

Bin Zhou

Jun Liu

Yang Zhang

Tao Sun

Jun Feng Liu

Tongshang Su

Haitao Wang

Leilei Cheng

Guangyao Li

Jingang Fang

Yongchao Huang

Ming Wang

Can Yuan

Dongfang Wang

Dacheng Zhang

Cheng Xu

Jun Cheng

Chao Wang

Jingjing Xia

Xuechao Sun

Chaowei Hao

Zhiwen Luo

Danyang Ma

Junlin Peng

Jiawen Song

Xuanang Wang

The present disclosure provides a display substrate, a manufacturing method, and a display device. The method includes: providing a base substrate; forming a driving circuitry layer on the base substrate; forming an inorganic insulation layer on the driving circuitry layer; forming a pattern of a planarization layer on the inorganic insulation layer, the planarization layer being made of an organic material; forming a first transparent conductive layer on the planarization layer; and forming a through hole through a patterning process, a photoresist used during the exposure of the patterning process including an organic material.

Display substrate and manufacturing method, and display device

Provided are an array substrate, a display panel, a display apparatus and a method for manufacturing an array substrate. The array substrate includes: a base substrate; an active layer, which is located on one side of the base substrate, where the active layer includes a channel region, a conductive source region, which is located on one side of the channel region, and a conductive drain region, which is located on the other side of the channel region; and a metal layer, which is located on the side of the active layer that is away from the base substrate, where the metal layer includes a gate electrode and a signal line, which are arranged on the same layer, and the thickness of the gate electrode perpendicular to the base substrate is less than the thickness of the signal line perpendicular to the base substrate.

Array substrate, display panel, display apparatus, and method for manufacturing array substrate

The present disclosure provides an array substrate, a method for manufacturing the array substrate, a display panel and a display device. The array substrate includes: a substrate; a planarization layer on a side of the substrate; a pixel defining layer configured to define a pixel opening region and located on a side of the planarization layer away from the substrate; an anode in the pixel opening region and on a side of the planarization layer away from the substrate. The array substrate further includes an intermediate insulation layer between the planarization layer and the pixel defining layer. The intermediate insulation layer has a chemical polarity between a chemical polarity of the planarization layer and a chemical polarity of the pixel defining layer.

Array substrate, manufacture method thereof, display panel and display device

A displaying substrate, a manufacturing method thereof, and a display panel. The displaying substrate includes: a first capacitor electrode at least partially located in luminous zones, a buffer layer covering the first capacitor electrode, and a second capacitor electrode and an active layer that are disposed on the buffer layer and do not overlap with each other, wherein the active layer is located in a non-luminous zone, and the first capacitor electrode, the buffer layer and the second capacitor electrode form a storage capacitor.

Display substrate including a common buffer layer

A display panel and a fabricating method thereof, and a displaying device. The display panel includes a substrate, a resistance reducing trace, an inter-layer-medium layer and a signal line. The substrate is divided into a plurality of sub-pixel regions and a pixel separating region. The resistance reducing trace is provided on the pixel separating region of the substrate. The inter-layer-medium layer is provided on the substrate, and the inter-layer-medium layer has an opening exposing the resistance reducing trace. The signal line is provided within the opening, the signal line is connected to the resistance reducing trace, the signal line is distributed in a column direction along the display panel, and in a row direction along the display panel, a width of the opening is greater than or equal to a width of the signal line.

Display panel with resistance-reducing trace and signal line configured to reduce peel-off, and fabricating method thereof, and displaying device

Provided are a display substrate and a display apparatus. The display substrate includes a base substrate, and an auxiliary cathode structure located on a side of the base substrate, the auxiliary cathode structure including a first conductive layer, an intermediate support layer, and a second conductive layer. In an implementation, a side of the intermediate support layer close to the first conductive layer includes any one or more of first protrusions and first grooves, and a side of the first conductive layer close to the intermediate support layer includes any one or more of second grooves engaged with the first protrusions and second protrusions engaged with the first grooves which are correspondingly disposed.

Display substrate including an auxiliary cathode structure and display apparatus having the same

A light-emitting device includes: an anode disposed on a base, and a cathode disposed on a side of the anode facing away from the base. The anode includes a light-reflecting sub-electrode and a light-transmitting sub-electrode located on a surface of the light-reflecting sub-electrode facing away from the base, and an orthographic projection of the light-transmitting sub-electrode on the base is located within a range of an orthographic projection of the light-reflecting sub-electrode on the base. The light-reflecting sub-electrode includes a metal pattern and a metal oxide pattern, and the metal oxide pattern is located in at least part of a region around the metal pattern.

Light-emitting device and method for manufacturing the same, and display panel

A display substrate, a method for forming the display substrate and a display device are provided. The display substrate includes: a first conductive pattern located on a base substrate, where a ring-shaped conductive protection structure is arranged at an edge of a preset region of the first conductive pattern and surrounds the preset region, and the conductive protection structure is made of an anti-dry-etching material; an insulation layer covering the first conductive pattern; and a second conductive pattern located on a side of the insulation layer away from the first conductive pattern, where the second conductive pattern is electrically connected to the first conductive pattern through the via-hole.

Display substrate and method for forming the same and display device

The disclosure provides a thin film transistor, a manufacturing method thereof, a display substrate and a display apparatus. The thin film transistor comprises a base substrate, and an active layer disposed on the base substrate, and the active layer comprises a channel region, and a source contact region and a drain contact region respectively positioned at two sides of the channel region; and a portion of at least one of the source contact region and the drain contact region close to the channel region includes a plurality of first sub-grooves disposed at a side of the active layer proximal to the base substrate and a plurality of second sub-grooves disposed at a side of the active layer distal to the base substrate, and the plurality of first sub-grooves and the plurality of second sub-grooves being alternately disposed along a direction parallel to an extension of the channel region.

Thin film transistor and manufacturing method thereof, display substrate and display apparatus

The present disclosure provides a method for detecting a display substrate and a device for detecting a display substrate. The method includes: exciting a threshold voltage of a driving transistor in each pixel driving circuit in the display substrate, so that the threshold voltage of the driving transistor with a shifted threshold voltage is further shifted; inputting a detection signal to each pixel driving circuit in the display substrate, where the detection signal is a signal enabling the pixel driving circuit to operate normally; and judging whether the display substrate is normal or not according to the voltage output by each pixel driving circuit.

Method and device for detecting display substrate

This disclosure discloses an array substrate, and a production method, a display panel, and a display apparatus thereof. Particularly, this disclosure proposes a method of producing an array substrate, having the following steps: providing a substrate having a drive transistor region and a switch transistor region thereon; forming an preset layer for active layer on a side of the substrate; patterning the preset layer for active layer to form a drive active layer and a switch active layer, wherein an orthographic projection of the drive active layer on the substrate is located in the drive transistor region, an orthographic projection of the switch active layer on the substrate is located in the switch transistor region, and a carrier concentration in the drive active layer is less than a carrier concentration in the switch active layer.

Array substrate, and production method thereof, display panel, and display apparatus

The present disclosure provides a transistor and a manufacturing method thereof, a display substrate and a display device. The transistor includes: a base structure; an active layer on the base structure; and a gate electrode, a source electrode and a drain electrode that are all located on a side of the active layer distal to the base structure. The active layer includes a first region corresponding to an orthographic projection of the gate electrode on the base structure and a second region outside the orthographic projection. A surface of the base structure in contact with the active layer in the first region is not in the same plane as a surface of the base structure in contact with the active layer in the second region. The active layer in the first region has substantially the same thickness as a thickness of the active layer in the second region.

Transistor and manufacturing method thereof, display substrate and display device

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Beijing, China

Liusong Ni