Wuxi Unicomp Technology Co., Ltd.

Liucheng Wang

Wei Zhang

Xiaojun Qiu

Jun Liu

Wenwen Kong

Qi Hou

An open microfocus X-ray source and a control method thereof are provided. The open microfocus X-ray source includes: an open X-ray tube, a high voltage power supply (HVPS) system, a vacuum system and a control system. The open X-ray tube includes a cathode system, a deflection system and a focusing system. The HVPS system is configured to provide an emission current I, an accelerating high voltage Uand a grid voltage Ufor an electron beam. The vacuum system is configured to perform vacuumization. The control system is configured to control, according to a spot size of an electron beam for bombarding an anode target, the HVPS system to adjust the emission current I, the accelerating high voltage U, a deflection coil current Iof the deflection system, and a focusing coil current Iof the focusing system, such that the spot size meets a preset requirement.

Open microfocus x-ray source and control method thereof

A filler for vacuum brazing of TU1 oxygen-free copper is an Au&#x2014;Cu&#x2014;Ni filler including the following elemental compositions in a specified proportion: 69% to 90% of Au, 9% to 30% of Cu, and 1% to 5% of Ni. The filler has a melting temperature of 900&#xb0; C. to 910&#xb0; C. The filler for vacuum brazing of TU1 oxygen-free copper can be used for brazing X-ray tube anodes, thereby realizing effective vacuum brazing.

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Wuxi, China

Liucheng Wang