Ondine International Ltd.

Lisa Pedigo

Nicolas Loebel

Cale Street

The present invention includes a composition for enhancing the antimicrobial efficacy of photodynamic disinfection against Gram-negative organism that is receptive to paraben potentiation using a composition comprising a photosensitizer and at least one paraben. The present invention also includes a method for photodynamic disinfection comprising applying the composition to a desired treatment area and applying light to the desired treatment area at a wavelength absorbed by the photosensitizer so as to inhibit Gram-negative organism located within the treatment area wherein the Gram-negative organism is receptive to paraben potentiation.

Composition for photodynamic disinfection

The present invention provides a photosensitizing composition for treatment of MRSA comprising a photosensitizer and chlorhexidine and a pharmaceutically acceptable carrier. The present invention also provides a method for reducing disease causing microbes comprising: applying the composition comprising a photosensitizer, chlorhexidine at a concentration of more than about 0.01% and less than about 2% v/v, and a pharmaceutically acceptable carrier to a treatment site; and applying light to the treatment site at a wavelength absorbed by the photosensitizer so as to reduce the microbes at the treatment site.

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Lake Forest Park, WA, United States of America

Lisa Pedigo