China Enfi Engineering Corporation

Beijing Nmc Co., Ltd.

Liqiong Hu

Dong Li

Zhenmin Zhang

Zhuo Chen

Kai Xie

Yi Cheng Lin

Kefei Cao

Shuangjie Feng

Rangxian Zhu

Linsheng Wang

Xiaohong Hao

The present disclosure discloses a lance, including a lance head having: a first tube; a second tube, in which the first tube is fitted over the second one; and a through hole tube, in which the through-hole tube has a plurality of axial through holes, a second channel is defined by the first tube, the second tube and the through hole tube, and a first channel is defined by an inner cavity of the second tube and the plurality of axial through holes; an air inlet tube in fluid communication with the second channel; and an air inlet seat connecting with the second tube and having an air inlet channel which is in fluid communication with the first channel. The lance according to the present disclosure can spray uniform gas and can reduce energy consumption. The present disclosure also discloses a multi-fluid lance device equipped with the lance.

Lance and multi-fluid lance device equipped with the same

A lance including: a central pipe having a wear-resistant ceramic layer coated on an inner wall thereof; a central casing pipe having a casing pipe groove in an outer wall thereof, in which the central casing pipe is fitted over the central pipe; an intermediate pipe fitted over the central casing pipe, in which a combustion-supporting gas chamber is formed between a front part of the central pipe and the intermediate pipe, and an intermediate pipe groove is formed in an outer wall of the rear part; and an outer casing pipe fitted over the intermediate pipe, in which a cooling medium chamber is formed between a front part of the intermediate pipe and the outer casing pipe, and a cooling medium injection channel is defined by an inner wall of the outer casing pipe and the intermediate pipe groove.

Lance

A method of online predicting maintenance of an apparatus is disclosed. Using an optical emission spectroscopy (OES) positioned on the apparatus and the change of emission spectrum intensity detected by the OES in the process, according to the detected results, measuring the parameter in the process, the function relation between the process parameter and spectrum intensity is acquired. A control threshold is decided by the processing requirement to the apparatus. When the parameter exceeds the control threshold, maintenance to the etching apparatus is engaged in order to avoid processing error caused by frequent shutdown or deficient maintenance which is estimated by experience, and hence decreasing the cost and increasing processing efficiency of substrates (such as silicon wafers) without changing apparatus and adding other online sensor, and improving production rate by avoiding waste substrates caused by error processing results. The method is suitable for semiconductor substrate etching maintenance of the apparatus and also other maintenance of the apparatus.

Method of online predicting maintenance of an apparatus

Growing community of inventors

Beijing, China

Liqiong Hu