Beijing Nmc Co., Ltd.

Liqiang Yao

A gas distribution apparatus for a plasma processing equipment is provided. The gas distribution apparatus includes a support plate () and a showerhead electrode () that are secured together parallelly to define a chamber for gas distribution. A first gas distribution plate () is arranged in the chamber horizontally. On an upper surface of the gas distribution plate (), at least one circumferential gas-flow groove () around its axis and a plurality of radial gas-flow grooves () communicating with the at least one circumferential gas-flow groove () is arranged. A plurality of axial viahole () are formed in the at least one circumferential gas-flow groove () and the plurality of radial gas-flow grooves (). The gas distribution apparatus can achieve a uniform gas distribution in the plasma processing equipment.

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Beijing, China

Liqiang Yao