Agc Glass Europe

Agc Inc.

Rhodia Operations

Rhodia Chimie

Cnrs

Quertech Ingenierie

Lionel Ventelon

Bruno Cosijns

Olivier Bouesnard

Julien Hernandez

Laurent Guy

Denis Busardo

Pierre Boulanger

Emmanuelle Allain

Frederic Guernalec

Ingrid Marenne

Joseph Leclercq

Benjamine Navet

Françoise Lafuma

Christophe Chassenieux

Christelle Perreur

Marc Airiau

Pierre Boulager

The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 10ions/cmand 2.5&#xd7;10ions/cm.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.

Ion implantation process and ion implanted glass substrates

A solar energy reflector () comprises a mirror () with no copper layer laminated to a supporting sheet () by means of a bonding material (). The edges of the mirror () are provided, at least on a portion forming the major part of their height and closest to the metallic sheet, with an edge protection () made of a material comprising silicone, polyurethane and/or acrylic and the material forming the edge protection () is different from the bonding material ().

Solar energy reflector

Mirrors with no copper layer according to the present invention comprise a glass substrate, a silver coating layer provided at a surface of the glass substrate and at least two paint layers covering the silver coating layer, the outermost paint layer comprising a polyurethane resin based paint. They are characterized in that the paint layers are free of alkyd resin and in that the first paint layer closest to the silver coating layer has a thickness of at least 10 &#x3bc;m.

Copper-free mirror having acrylic and polyurethane paint layers free of alkyd

Precipitated silicas including clusters of large primary silica particles having at the surface thereof small primary silica particles, have a specific surface area CTAB (S) ranging from 60 to 400 m/g; a cluster average size d50, as measured by XDC grading after ultrasound deagglomeration, such that d50 (nm)&#x3e;(6214/S(m/g)+23; a pore volume distribution such that V/V&#x3e;0.906&#x2212;(0.0013&#xd7;S(m/g)); and a pore size distribution such that Mode (nm)&#x3e;(4166/S(m/g))&#x2212;9.2; such silicas are useful reinforcing fillers for polymers.

Precipitated silica having particular morphology, grading and porosity, preparation thereof and reinforcing of polymers therewith

A process for manufacturing mirrors with increased reflectance includes forming a silver layer on a surface of a glass substrate, during which the surface is contacted with a silvering solution, and painting at least one paint layer to cover the silver layer. Between forming the silver layer and the painting, the process includes reheating the silver layer to a temperature of at least 200&#xb0; C.

Mirror with increased reflectance

Mirror consisting of a glass substrate having a front surface and a rear surface, the rear surface carrying, in order, a silver coating layer and at least one base paint layer. The glass substrate, the silver coating layer, and the at least one base paint layer each have an edge portion having a rear facing surface arranged at an acute angle to the front surface of the mirror. An additional paint layer covers the entire surface of the base paint layer and the rear facing surfaces of the glass substrate and the silver coating layer.

Mirror

The invention concerns a method for preparing anisotropic silica aggregates comprising the following steps: a) contacting at least one polymer with non-aggregated silica particles and/or highly dispersed in an aqueous medium, with a ratio R, polymer weight to silica particle surface, ranging between 0.03 and 2 mg/m; 2; and whereof the electrostatic value of the silica particle surface is not less than the value of the charge of the silica particle surface measured in an aqueous phase without added salts at a pH not less than 7; b) consolidating the aggregates obtained at step a) either by heat treatment, or by precipitation of a mineral compound. The invention also concerns a silica aggregate comprising a chaining of elementary particles whereof the number of particles ranges between 5 and 15, whereof 80% of elementary particles are in contact with not more than 2 particles and whereof the greatest distance measurable between 2 points of the aggregate is not more than 5 times the average size of one elementary particle.

Method for preparing anisotropic silica aggregates

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Jumet, Belgium

Lionel Ventelon