Mks Instruments, Inc.

Linnell Martinez

Aaron Michael Burry

Peter Paul

Aaron T Radomski

Jonathan W Smyka

Eldridge M Mount, Iv

Scott White

David Miller

A controller for a plasma generation system includes a model evaluation module receives a sensed value that varies in accordance with a state of a plasma controlled by a RF power generator. The model evaluation module generates a plasma parameter that varies in accordance with the sensed value. A model integration module receives the plasma parameter, integrates the plasma parameter, and outputs an integrated model parameter. An IEDF evaluation module receives the integrated model parameter and generates an ion energy distribution function (IEDF) in accordance with the integrated model parameter. An IEDF controller module receives the IEDF and generates a signal for controlling a RF generator. A RF generator control module receives the signal and generates an RF generator control signal to control at least one of power, frequency, or phase of the RF power generator.

Real-time, non-invasive IEDF plasma sensor

A radio frequency (RF) generator is configured to generate a RF signal. The RF signal can be modulated by a pulse having one or multiple states. During an initial state at pulse initiation, the RF generator adjusts the impedance match by selecting the frequency of the RF signal. During a second state of the pulse, the RF generator adjusts the impedance match using a matching network. The first state includes controlling the RF generator to output a power burst, and the second state includes controlling the generator to output an operating power.

Method and apparatus to enhance sheath formation, evolution and pulse to pulse stability in RF powered plasma applications

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San Jose, CA, United States of America

Linnell Martinez