Orbotech Lt Solar, LLC.

Novellus Systems Incorporated

Linh Can

Masato M Toshima

Wendell T Blonigan

Kam S Law

Robin K F Law

Jay C Cho

Wendell Thomas Blonigan

Robin KF Law

To provide a processor and a processing method to make the operation to load and unload workpieces to and from a processing chamber more efficient, and improve workpiece processing efficiency. A processor equipped with a processing chamberwherein a first supply/discharge port and a second supply/discharge port have been provided, characterized by being equipped with a first transport mechanism to perform an operation to supply and discharge workpiecesvia the aforementioned first supply/discharge port, a second transport mechanism to perform an operation to supply and discharge workpiecesvia the aforementioned second supply/discharge port, an exchange means to deliver workpiecesthat have been loaded for processing by the aforementioned first transport mechanism to the aforementioned second transport mechanism, and deliver workpiecesthat have been loaded for processing by the aforementioned second transport mechanism to the first transport mechanism, and a control unitto drive the aforementioned first transport mechanism and second transport mechanism, and alternately supply unprocessed workpieces from the aforementioned first supply/discharge port and the aforementioned second supply/discharge port to the aforementioned processing chamber for processing.

Processing apparatus and processing method

A showerhead for a plasma process apparatus for processing substrates, comprising a showerhead body comprising a top plate and a bottom plate defining a cavity in between; a gas inlet formed in the top plate; a perforated plate positioned between the top plate and the bottom plate and dissecting the cavity into an upper gas compartment and a lower gas compartment; and, wherein the bottom plate comprises a plurality of elongated diffusion slots on its lower surface and a plurality of diffusion holes on its upper surface, each of the diffusion holes making fluid connection from the lower gas compartment to more than one of the diffusion slots.

Showerhead assembly for plasma processing chamber

In one embodiment, a lifting apparatus in an integrated circuit fabrication system includes a sliding mechanism supporting a rotatable assembly and an actuator configured to vertically move the sliding mechanism. Among other advantages, the apparatus allows the rotatable assembly to be lifted and then rotated to allow access to interior components, for example. In one embodiment, the rotatable assembly comprises a lid of a process chamber.

Lifting mechanism for integrated circuit fabrication systems

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San Jose, CA, United States of America

Linh Can