Micron Technology Incorporated

Lingyu Kong

Sok Han Wong

Lifang Xu

Indra V Chary

Shuangqiang Luo

Leroy Ekarista Wibowo

Venkata Satyanarayana Murthy Kurapati

David A Daycock

David Daycock

A microelectronic device comprises a stack structure comprising insulative structures vertically interleaved with conductive structures, first support pillar structures vertically extending through the stack structure in a first staircase region including steps defined at edges of tiers of the insulative structures and conductive structures, and second support pillar structures vertically extending through the stack structure in a second staircase region including additional steps defined at edges of additional tiers of the insulative structures and conductive structures, the second support pillar structures having a smaller cross-sectional area than the first support pillar structures. Related memory devices, electronic systems, and methods are also described.

Methods of forming microelectronic devices including differently sized conductive contact structures

An electronic device comprises a source stack comprising one or more conductive materials. A source contact is adjacent to the source stack and a source seal is on a portion of the source contact. Tiers of alternating conductive materials and dielectric materials are adjacent to the source contact. Pillars extend through the tiers and the source contact and into the source stack. Additional electronic devices, electronic systems, and methods of forming the electronic devices are disclosed.

Electronic devices including a source seal, and related methods and electronic systems

Microelectronic devices including differently sized conductive contact structures, and related memory devices, electronic systems, and methods

A method used in forming a memory array comprises forming a stack comprising vertically-alternating first tiers and second tiers. A first insulator tier is above the stack. First insulator material of the first insulator tier comprises at least one of (a) and (b), where (a): silicon, nitrogen, and one or more of carbon, oxygen, boron, and phosphorus, and (b): silicon carbide. Channel-material strings are in the stack and in the first insulator tier. Conducting material is in the first insulator tier directly against sides of individual of the channel-material strings. A second insulator tier is formed above the first insulator tier and the conducting material. Second insulator material of the second insulator tier comprises at least one of the (a) and the (b). Conductive vias are formed and extend through the second insulator tier and that are individually directly electrically coupled to the individual channel-material strings through the conducting material. Other aspects, including structure independent of method, are disclosed.

Memory arrays and methods used in forming a memory array comprising strings of memory cells

Growing community of inventors

Singapore, Singapore

Lingyu Kong