Western Digital (fremont), Inc.

Ling Wang

Hai Sun

Dujiang Wan

Xianzhong Zeng

Hongping Yuan

Zhigang Bai

Yuankai Zheng

Shaoping Li

Michael L Mallary

Ming Mao

Feng Q Liu

Gerardo Bertero

Rongfu Xiao

Qunwen Leng

Zhitao Diao

Anup Roy

Zhihong Zhang

Yunhe Huang

Chen Jung Chien

Yugang Wang

Hong Zhang

Tao Pan

Ying Hong

Bing K Yen

Fenglin Liu

Weimin Si

Xiaoyu Yang

Jikou Zhou

Yuan Yao

Miao Wang

Yang Xiang

Iulica Zana

A tunnel magnetoresistance (TMR) read sensor having a tabbed AFM layer and an extended pinned layer and methods for making the same are provided. The TMR read sensor has an AFM layer recessed from the air bearing surface, providing a reduced shield-to-shield distance.

Magnetic read head with antiferromagentic layer

Method of manufacturing a magnetic read head

A magnetic transducer has air-bearing surface (ABS) and includes a main pole and at least one coil. The coil(s) energize the main pole. The main pole includes a yoke and a pole tip having an ABS-facing surface. The pole tip includes a sidewall having a radius of curvature and a chisel angle. The chisel angle is measured between a yoke direction perpendicular to the ABS and a tangent the sidewall. The chisel angle for the pole tip continuously increases in the yoke direction to a maximum a first distance from the ABS-facing surface in the yoke direction. The radius of curvature for the pole tip has a minimum radius of curvature a second distance from the ABS-facing surface in the yoke direction. The first distance is greater than the second distance.

Magnetic write pole having engineered radius of curvature and chisel angle profiles

System and methods are provided for the manufacture of a magnetic write head including a pole and yoke region, and a nose shape transition region connecting the yoke to the pole having very small minimum radius of curvature, providing for a sharp transition. A double mask technique is used providing for the adjustment of an offset and illumination conditions between the first and second mask, which provides the capability of tuning the shape of the transition region, and achieving features that would otherwise not be achievable due to distortions caused by optical proximity effect.

Systems and methods for using double mask techniques to achieve very small features

Innovative techniques are disclosed for fabricating microelectronic devices using an alternating phase shift mask. Some embodiments of the invention encompass a double exposure technique that utilize high resolution line patterning such that two opaque lines intersect at an angle. After development, substantially circular images may be formed. In certain embodiments, high resolution disk imaging as small as 60 nm is possible.

Double exposure technique for high resolution disk imaging

A method for fabricating a magnetic recording transducer having a magnetic writer pole with a short effective throat height is provided. In an embodiment, a writer structure comprising a magnetic writer pole having a trailing bevel and a nonmagnetic stack on the top surface of the writer pole is provided. A dielectric write gap layer comprising alumina is deposited over the trailing bevel section and the nonmagnetic stack; and at least one etch stop layer is deposited over the dielectric write gap layer. A layer of nonmagnetic fill material is deposited over the etch stop layer and to form a nonmagnetic bevel by performing a dry etch process. The etch stop layer(s) are removed from the short throat section; and a trailing shield is deposited over the short throat section, nonmagnetic bevel, and nonmagnetic stack top surface.

Process for manufacturing a perpendicular magnetic recording writer pole with nonmagnetic bevel

Methods of patterning a material are disclosed. A first resist pattern is formed on a field. A protective layer is formed over the first resist pattern and at least a portion of the field. A second resist pattern is formed over a portion of the protective layer. A portion of a material to be patterned deposited adjacent to the first and second resist patterns is removed.

Resist pattern protection technique for double patterning application

A method for fabricating a magnetic transducer is described. The magnetic transducer includes a pole having a pole tip and a flared region. The method Includes providing a first mask layer on the pole and providing a second mask layer on the first mask layer. The first mask layer is soluble in a predetermined solution and has a first thickness. The second mask layer has a second thickness greater than the first thickness. The method also includes forming a mask from the first mask layer and the second mask layer. The step of forming the mask layer includes using the predetermined solution. The mask has a pattern that exposes a portion of the pole tip and covers a portion of the flared region. The method also includes providing a wrap-around shield on at least the pole tip.

Method for providing a wrap-around shield for a magnetic recording transducer

An optical mask for providing a pattern for portion of an electronic device, such as a magnetic recording transducer, is disclosed. The optical mask includes a device feature and at least one detached correction feature. The device feature includes a corner corresponding to a device corner of the pattern. The device corner has an angle of greater than zero degrees and less than one hundred eighty degrees. The at least one detached correction feature resides in proximity to but is physically separated from the corner. Each of the at least one detached correction feature is sub-resolution.

Method and system for providing optical proximity correction for structures such as a PMR nose

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Hercules, CA, United States of America

Ling Wang