Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Boe Technology Group Co., Ltd.

China Petroleum Chemical Corporation

Beijing Research Institute of Chemical Industry, China Petroleum & Chemical Corporation

Beijing Boe Technology Development Co., Ltd.

Institute of Radiation Medicine, Academy of Military Medical Sciences, Pla.

Hainan Yangpu New & Special Medicine Co., Ltd.

Ling Han

Chengshao Yang

Tao Ma

Wei Zhang

Guixiang Zhu

Botao Song

Ning Zhang

Ning Xu

Wenxi Ji

Binbin Cao

Lin Chen

Wenlong Wang

Liang Lin

Cui Zheng

Yi Zou

Xinyang Tang

Lin Wang

Peng Guo

Jun Ma

Tao Peng

Yinhu Huang

Lu Yan Li

Nan Chen

Yi Yang Ren

Yunhai Wan

Ke Cao

Ying Shi

Zhiyuan Lin

Junhao Han

Mingfu Lyu

Shengqi Wang

Dengfeng Wang

Lizhi Liu

Yu Wei

Ronghua Jin

Taoyi Zhang

Jianping Ren

Shouguo Zhang

Jufeng Yu

Qiujun Lu

Xiaowei Zhu

Yiguang Jin

Fengsheng Che

Xuerong Yao

Minqiao Ren

Qingmeng Wu

Shangri Wang

Fengsheng Room 2501 Che

A biodegradable film is prepared from a composition that includes a copolyester obtained by extrusion reaction of a branched aliphatic-aromatic copolyester derived from monomer a, monomer b, monomer c and monomer d with an organic peroxide. The film can be completely degraded into small molecular products such as carbon dioxide, water and the like under natural or composting conditions. Moreover, the film can be prepared having a thickness of 4-50 μm as required, and its mechanical properties can reach the same level as or even better than those of LDPE film.

High strength ultra-thin biodegradable film and preparation method thereof

The present disclosure provides a manufacturing method of a display substrate, a display substrate and a display device, belongs to the field of display technology, and can at least partially solve a problem of residual sand in the display substrate. The manufacturing method of the display substrate includes: providing a base; forming a passivation layer on a surface of the base; forming an amorphous oxide conductive material layer on a surface of the passivation layer facing away from the base; forming a photoresist pattern on the oxide conductive material layer, the photoresist pattern having an exposure region; etching a portion of the oxide conductive material layer in the exposure region of the photoresist pattern to form a hollow position exposing a portion of the passivation layer; and removing a certain thickness material of the portion of the passivation layer exposed through the hollow position.

Manufacturing method of display substrate for removing residual sand

An array substrate includes a base substrate and a GND trace. The GND trace is disposed along an edge of the substrate, and the GND trace includes a plurality of conductive line segments separated from each other and a connection structure disposed on a side of the GND trace away from the base substrate. The connection structure electrically connects the conductive line segments.

Array substrate, display panel and display device

A polyester composition includes a first polyester selected from one or more of aliphatic-aromatic copolyesters, which is a copolymer comprising repeating units A as shown in formula (I) and repeating units B as shown in formula (II), in which m is an integer of 2 to 10 and n is an integer of 2 to 8; p is an integer of 2 to 10; and m, n and p are the same or different from each other. Optionally, the polyester composition has a second polyester. The polyester composition includes at least two polyesters. The polyester composition can be used in shape memory materials, 3D print wires, heat shrinkable sleeves, functional layers, medical limb immobilization braces, heat shrinkable thin films, nonwoven fabrics, elastic fibers, etc. 

Polyester composition, preparation method therefor and application thereof

A mask plate, a method for manufacturing a patterned film layer and a manufacturing method of a thin film transistor are provided by the embodiments of the present disclosure. The mask plate includes: a first pattern and a second pattern; the first pattern includes a first sidewall, a second sidewall, a connecting portion connecting the first sidewall and the second sidewall, and an extension portion on a side of the connecting portion away from the first sidewall; the second pattern is between the first sidewall and the second sidewall; a slit is between the first pattern and the second pattern, and the slit is configured for diffraction. The positive photoresist is used, the extension portion of the mask plate makes that the pattern of the photoresist formed by the mask plate with the extension portion has a region corresponding to the extension portion and the 'bolt effect' is avoided.

Mask plate, manufacturing method of patterned film layer and manufacturing method of thin film transistor

The present disclosure provides a thin film transistor, including: an active layer, a source and a drain electrically coupled with the active layer, and a plurality of doped layers located between the source and the active layer and between the drain and the active layer, a resistance of one of the plurality of doped layers farthest away from the active layer is smaller than that of any other doped layer. The disclosure further provides a gate driving circuit, a display substrate and a display device. With the present disclosure, current loss of a current passing through the doped layers of the thin film transistor is reduced, on-state current of the thin film transistor is improved and a situation that output signals of the thin film transistor are insufficient is avoided.

Thin film transistor and manufacturing method thereof, gate driving circuit, display substrate and display device

The present application discloses a display substrate. The display substrate includes a base substrate; a first sensing layer having a plurality of first sensing electrodes extending substantially along a first direction; and a second sensing layer insulated from the first sensing layer and having a plurality of second sensing electrodes extending substantially along a second direction. Each of the plurality of first sensing electrodes includes a pair of first sub-electrodes substantially parallel to each other and extending substantially along the first direction, and a plurality of first photoconductive bridges each of which interposed between the pair of first sub-electrodes. Each of the plurality of second sensing electrodes includes a pair of second sub-electrodes substantially parallel to each other and extending substantially along the second direction, and a plurality of second photoconductive bridges each of which interposed between the pair of second sub-electrodes.

Display substrate, display apparatus, method of controlling a display apparatus, and method of fabricating display substrate

A display panel, a manufacturing method thereof and a display device are provided. The display panel includes an array substrate and an opposing substrate which are disposed opposite to each other; the array substrate includes a first base substrate and a source electrode, a drain electrode and an active layer which are disposed on the first base substrate, and a passivation layer disposed on the source electrode, the drain electrode and the active layer; the opposing substrate includes a second base substrate and a gate electrode disposed on the second base substrate; the active layer includes a source electrode region, a drain electrode region and a channel region between the source electrode region and the drain electrode region, the gate electrode is disposed opposite to and spaced apart from the passivation layer at a position where the channel region is located.

Display panel having an opposing substrate provided with a gate electrode, manufacturing method thereof, and display device

A manufacturing method of the invention, comprising: successively forming an insulation layer and a photoresist layer on a transparent substrate; performing an exposure and a development on the photoresist layer by a back exposure process, so as to form a trench in the photoresist layer, an open area of the trench proximal to the insulation layer is larger than that of the trench distal to the insulation layer; removing a portion of insulation material in a region of the insulation layer exposed through the trench by an etching process, so as to form a slot in the insulation layer; forming a metal layer on a side of the photoresist layer distal to the insulation layer, a portion of the metal layer is embedded in the slot; removing the photoresist layer and the metal layer thereon by a stripping process, and retaining the portion of the metal layer in the slot.

Pixel structure and manufacturing method thereof, array substrate and display apparatus

The embodiments of the present invention provide an OLED array substrate, a method for manufacturing the OLED array substrate, and a touch display device. The OLED array substrate includes a first metal layer pattern, a transparent conductive layer pattern, an insulating layer pattern disposed between the first metal layer pattern and the transparent conductive layer pattern. The first metal layer pattern includes a metal bridge line. The transparent conductive layer pattern includes an anode of an OLED, a plurality of first electrodes extending in a first direction and a plurality of second electrodes extending in a second direction. Each of the first electrodes includes a plurality of first sub-electrodes, and each of the first sub-electrodes is electrically connected to a corresponding metal bridge line.

OLED array substrate, manufacturing method thereof and touch display device

There is disclosed a method of manufacturing an array substrate, the method including a step of forming thin film transistors on a substrate; wherein the step of forming the thin film transistors on the substrate includes: forming a first electrically conductive layer on the substrate; forming an insulating layer on the first electrically conductive layer; forming at least one common holes in the insulating layer to communicate with the first electrically conductive layer; forming a first connection portion, which is made of the same material as a second electrically conductive layer, in the at least one of the at least one common holes while forming the second electrically conductive layer on the insulating layer by using a single process, the first connection portion being in electrical contact with the first electrically conductive layer. In addition, there is disclosed an array substrate manufactured by the above method and a display device including the array substrate.

Array substrate and method of manufacturing the same, and display device

A fabrication method of a color filter substrate, a color filter substrate and a display device are provided. The fabrication method includes forming an interlayer insulating layer and a first color filter group above the conductive pattern, wherein, the first color filter group includes color filter(s) of at least one color, the interlayer insulating layer and the first color filter group are formed by a same material; the interlayer insulating layer is configured to electrically insulate the conductive connecting portion from the conductive bridging portion.

Fabrication method of color filter substrate, color filter substrate and display device

Embodiments of the present disclosure provide a thin film transistor (TFT) and a method of manufacturing the same, which enables to decrease the vertical resistance from the source and the drain to the polarity inversion region, so that the current from the source and the drain to the polarity inversion region may be increased, thereby improving the performances of the TFT. An active layer of the TFT is provided with a first groove and a second groove which neither pass through the active layer. A source and a drain of the TFT are formed at least partially in the first groove and the second groove, respectively. The source and the drain contact the active layer through the first groove and the second groove, respectively.

Thin film transistor and method of manufacturing the same

The present invention relates to a transparent copolyester, wherein the transparent copolyester comprises an aliphatic-aromatic copolyester segment A, a segment B having repeating units &#x2014;O&#x2014;CH(CH)&#x2014;C(O)&#x2014;, and structural units C derived from polyisocyanate(s), wherein the weight ratio for the segment A, segment B and structural unit C is 100:(100-2000):(0.1-10) and wherein the weight-average molecular weight Mw of the transparent copolyester is from 50,000 to 1,000,000. The present invention further relates to a preparation method for a transparent copolyester, including polymerizing lactide, a hydroxyl-terminated aliphatic-aromatic copolyester and a polyisocyanate in the presence of a catalyst; wherein the weight ratio for the aliphatic-aromatic copolyester, lactide and polyisocyanate is 100:(100-2000):(0.1-10). The present invention further relates to a transparent copolyester prepared by said method and an article made from the transparent copolyester according to present invention.

Transparent copolyester, preparing method thereof and articles made from the same

The present invention relates to a biodegradable composite and its preparation process, which composite is prepared by mixing feed stocks comprising a polylactic acid, an aliphatic-aromatic copolyester A, an aliphatic-aromatic copolyester B and an organic peroxide at a temperature between about 100 and about 200&#xb0; C. The present invention also relates to a disposable article, which is prepared from said biodegradable composite.

Biodegradable composite, the preparation process thereof, and a disposable article made therefrom

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Beijing, China

Ling Han