International Business Machines Corporation

Shin-etsu Chemical Co., Ltd.

The University of Melbourne

Technische Universiteit Eindhoven

Globalfoundries Inc.

Jsr Corporation

Jsr Micro Inc.

Linda Karin Sundberg

Daniel Sanders

Ratnam Sooriyakumaran

Luisa Dominica Bozano

Robert David Allen

Hiroshi Ito

Ho-Cheol Kim

Gregory Michael Wallraff

Phillip Joe Brock

Robert Dennis Miller

Joy Cheng

James L Hedrick

Dario Leonardo Goldfarb

Willi Volksen

Daisuke Domon

Hsinyu Tsai

Shu-Jen Han

Ekmini Anuja De Silva

Hoa D Truong

William Dinan Hinsberg

Krystelle Lionti

Carl Eric Larson

Andrea Fasoli

Satoshi Watanabe

Muthumanickam Sankarapandian

Teddie Peregrino Magbitang

Charles Thomas Rettner

Victor Yee-Way Lee

Geraud Jean-Michel Dubois

Jeffrey Donald Gelorme

Yoshio Kawai

Keiichi Masunaga

Li-Wen Hung

Dario Gil

Martha Inez Sanchez

Robert Allen David

Tom Van Der Pol

Thomas Geoffrey Pattison

Amy N Bowers

Elizabeth M Lofano

Dirk Pfeiffer

Sean David Burns

Gregory Breyta

David Robert Medeiros

Young-Hye Na

Yukio Nishimura

Alshakim Nelson

Takayuki Nagasawa

Sally Ann Swanson

Blake W Davis

Hareem Tariq Maune

Jitendra Singh Rathore

Ramakrishnan Ayothi

John David Bass

Qing Song

Leslie E Thompson

Mark Hull Sherwood

Brian Lin

Atsuko Ito, Legal Representative

Wyatt Thornley

Gregory M Walraff

Ekmini A DeSilva

Shiro Kusumoto

Mark Steven Slezak

Hoa Trung

Rutnam Sooriyakumaran

Matt Pinnow

Embodiments are disclosed for a method for generating a metal-oxide film. The method includes providing a metal ligand complex having a metal and a reactive moiety. The metal ligand complex is dissolved in a solvent that coats at least part of a substrate. Additionally, the method includes inducing a combustion process involving the metal ligand complex, in the absence of any additional fuel, to generate a film that is formed over at least part of the substrate. The film includes an oxide of the metal.

Generating metal-oxide film

A small-sized, portable enclosure protects a gas sensor against degradation due to environmental exposure and changes in atmospheric conditions. The protective enclosure includes an inlet for introduction of a gas into the enclosure, an outlet for release of the gas upon completion of a sensing run, and at least one retractable filter that removes from the inflowing gas deleterious compounds that can compromise the integrity of the sensor or cause the sensor to degrade over time. The enclosure does not include any filters during the measurement phase of the sensing run in order to allow the gas sensor to accurately measure an unmodified gas mixture and/or analyte.

Protective enclosure for gas sensors

A small-sized, portable enclosure protects a gas sensor against degradation due to environmental exposure and changes in atmospheric conditions. The protective enclosure includes an inlet for introduction of a gas into the enclosure, an outlet for release of the gas upon completion of a sensing run, and a number of in-line filters that remove from the inflowing gas sample analytes, contaminants, and other materials that can compromise the integrity of the sensor or cause the sensor to degrade over time. The enclosure does not include any filters during the measurement phase of the sensing run in order to allow the gas sensor to accurately measure an unmodified gas mixture and/or analyte.

A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

Multifunctional polymers

A crosslinked self-assembled monolayer (SAM), comprising surface groups containing a nitrogen-heterocycle, was formed on an oxygen plasma-treated silicon oxide or hafnium oxide top surface of a substrate. The SAM is covalently bound to the underlying oxide layer. The SAM was patterned by direct write methods using ultraviolet (UV) light of wavelength 193 nm or an electron beam, forming a line-space pattern comprising non-exposed SAM features. The non-exposed SAM features non-covalently bound DNA-wrapped carbon nanotubes (DNA-CNT) deposited from aqueous solution with a selective placement efficiency of about 90%. Good alignment of carbon nanotubes to the long axis of the SAM features was also observed. The resulting patterned biopolymer features were used to prepare a CNT based field effect transistor.

Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers

Negative-tone resist compositions and multifunctional polymers therein

Initial film layers prepared from tin(II) chloride spontaneously generate open cavities when the initial film layers are thermally cured to about 400&#xb0; C. using a temperature ramp of 1&#xb0; C./minute to 10&#xb0; C./minute while exposed to air. The openings of the bowl-shaped cavities have characteristic dimensions whose lengths are in a range of 30 nm to 300 nm in the plane of the top surfaces of the cured film layers. The cured film layers comprise tin oxide and have utility in gas sensors, electrodes, photocells, and solar cells.

Porous tin oxide films

An adhesive bonding method that includes bonding a handling wafer to a front side surface of a device wafer with an adhesive comprising N-substituted maleimide copolymers. The device wafer may then be thinned from the backside surface of the device wafer while the device wafer is adhesively engaged to the handling wafer. The adhesive can then be removed by laser debonding, wherein the device wafer is separated from the handling wafer.

Adhesive resins for wafer bonding

A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites. One-step simultaneous base treatment and solvent development employs a composition comprising a mix of the basic compound and solvent developer.

Resist performance for the negative tone develop organic development process

The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

Photoresist compositions and methods of use in high index immersion lithography

A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

Method of controlling orientation of domains in block copolymer films

Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.

Self-topcoating resist for photolithography

Growing community of inventors

Los Gatos, CA, United States of America

Linda Karin Sundberg